脈衝式離子源助鍍氟化鎂薄膜之研究

The research of pulse ion beam-assisted deposition of magnesium fluoride thin film

練政廷(Cheng-Ting Lian)

指導教授 ： 李正中

國立中央大學/理學院/光電科學研究所/碩士(2007年)

摘要

本論文是以熱阻舟蒸鍍系統配合脈衝式離子助鍍氟化鎂(MgF2)薄膜，研究脈衝式離子源對氟化鎂薄膜的光學特性、水氣吸收特性、微觀結構、表面粗糙度、應力與結晶特性的影響。
　　光學特性方面，在Constant Mode 離子助鍍下，氟化鎂薄膜的折射率明顯增加了，但是在短波段有著較大的光學損耗，相較於Constant Mode，在Pulse Mode 離子助鍍下，薄膜在短波長的光學損耗明顯減小了，但是有水氣吸收的現象發生；微觀結構方面，在離子助鍍下，薄膜的柱狀結構變得較明顯，柱與柱之間較緻密，薄膜的表面粗糙度在離子助鍍下，隨著Beam Current 增加有變小的趨勢；結晶特性方面，在離子助鍍下，結晶型態並無改變，但是薄膜的結晶方向更一致；應力方面，在Beam Current 1.0A 隨著Beam Current 增加，薄膜的壓應力越來越大。

關鍵字

離子源 ； 氟化鎂

並列摘要

The deposition of magnesium fluoride optical thin film by using thermal boat evaporation with pulse ion-assisted deposition (IAD) for UV application was investigated in this thesis. Due to the ion beam assistance, the optical properties and micro-structural properties of the magnesium fluorides thin films, including refractive index, surface roughness were significantly improved which are required in laser material processing and semiconductor lithography.

並列關鍵字

ion source ； magnesium fluoride

參考文獻

[2] P. J. Martin and H. Macleod, "Ion-beam-assisted deposition of thin films," Appl. Opt. 22, 178-184 (1983).

[3] M. Marinov, "Effect of Ion Bombardment on the Initial Stages of Thin Film Growth," Thin Solid Films 46, 267-274 (1977).

[4] E. H. Hirsch and I. K. Varga, Thin Solid Films 69, 99 (1980)

[6] P. J. Martin, W. G. Sainty, R. P. Netterfield, D. R. McKenzie, D. J. H. Cockayne, S. H. Sie, O. R. Wood, and H. G. Craighead, "Influence of ion assistance on the optical properties of MgF2 ," Appl. Opt. 26 (1987).

[7] M. Kennedy, D. Ristau, and H. Niederwald, "Ion beam-assisted deposition of MgF2 and YbF3 films," Thin Solid Films 333, 191-195 (1998).