微接觸印刷取代曝光顯影製程可行性探討

李騏仰(Chi-Yang Lee)

指導教授 ： 鄭榮偉

國立中正大學/工學院/機械工程學系/碩士(2015年)

摘要

本篇論文主要是探討微接觸印刷取代曝光顯影的製程，在一般的微影製程中在曝光的部分往往是比較困難且耗費成本的部分，而本論文利用微接觸印刷的方法結合潤濕梯度的原理使得光阻塗佈時就能產生圖案化的薄膜，再將其轉印於我們所需要的基板上，這不只使微接觸印刷上有更多的應用也減少微影製程的時間與成本。而目前此技術在Polydimethylsiloxane (PDMS)印模上利用氧電漿處裡所產生的潤濕梯度表面，已經能夠成功塗佈200 μm的圖案化薄膜，圖案的完整性也達到95%以上，並且能夠成功的應用於Indium tin oxide (ITO)玻璃基板的蝕刻應用。

關鍵字

微接觸印刷 ； 潤濕梯度

並列摘要

This paper focuses on the micro-contact printing to replace photolithography. Exposure process is more expensive and time-consuming in photolithography. In this paper, we use the micro-contact printing technology and wetting gradient principle to generate the patterned thin film of photoresist. This technology not only increase applications of the micro-contact printing also reduce the time and cost of the photolithography process.
This technology which have wetting gradient on PDMS stamp can be successfully patterned 200 μm thin film of photoresist. Pattern resolution also reached more than 95% , and can be successfully applied to etch applications on Indium tin oxide (ITO) substrate.

參考文獻

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