- 學位論文
光電產業周界空氣中異味二甲基硫及氯氣特徵分析
Analysis of Features of Foreign Flavors DMS and Cl2 in Ambient Air of Optoelectronics Industry
摘要
近年來，台灣光電產業產品的增加，造成光電製程污染物相對增加，光電製程廢水中含有二甲基亞碸((CH3)2SO，DMSO)及單乙醇胺(C2H5ONH2，MEA)等高濃度有機廢水，然而光電製程廢水經由廢水生物系統處理時，被微生物代謝轉化成易揮發異味的二甲基硫((CH3)2S，DMS)惡臭物質，處理含二甲基硫(DMS)惡臭廢氣時，需經由濕式洗滌塔添加次氯酸鈉(NaOCl)氧化處理，因過量添加次氯酸鈉(NaOCl)會造成二次污染物氯氣(Cl2)的衍生。光電產業製程廢水處理廠操作過程中常伴隨周界環境異味逸散，其中包含二甲基硫(DMS)、氯氣(Cl2)、氨氣(NH3)等污染物，尤其氯氣(Cl2)及氨氣(NH3)於空氣污染防治法中列為毒性污染物質，直接影響廢水處理廠操作維護人員嗅覺及健康的影響。因此，本研究針對南部某一光電廠區進行周界空氣中二甲基硫、氯氣及氨氣進行調查，並以攜帶型直讀儀器量測光電產業廠區周界(選擇41 個監測點)濃度變化。實驗監測結果，二甲基硫濃度大都介於4.63~37.54 ppb 之間，平均濃度約12.97 ppb。氯氣濃度大都介於0~2.88 ppb 之間，平均濃度約1.36 ppb。NH3濃度檢測ND。本研究區域空氣品質皆符合空氣污染物周界排放標準(二甲基硫<0.2 ppm、氯氣<0.02ppm、氨氣<1 ppm)。
並列摘要
In recent years, as the variety of products of Taiwan's optoelectronics industry increases, the pollutants from optoelectronics processes increase accordingly. The wastewater from optoelectronics processes contains high concentration organic wastewater, such as DMSO and MEA. When the wastewater is treated by the wastewater biological system, it is converted by microbial metabolism into DMS odorant, which is likely to volatilize foul odor. When treating the effluvial waste gas containing DMS, the scrubber should be filled with NaOCl for oxidation treatment. However, the excessive NaOCL can produce a secondary pollutant like Cl2. The odor including DMS, Cl2 and NH3 pollutants are often diffused with the operating procedure of wastewater treatment plant. Among these pollutants, Cl2 and NH3 are listed as toxic pollutants in the Air Pollution Control Act, seriously affecting the sense of smell and health of the operators and maintainers of the wastewater treatment plants. Therefore, this study investigated the DMS, Cl2, and NH3 in the ambient air of an optronics corporation in southern Taiwan. A portable gas detector was used to measure the concentration changes in 41 monitoring points around the investigated area. The monitoring results showed that the DMS concentration ranged between 4.63 and 37.54 ppb, and the mean concentration was 12.97 ppb. The Cl2 concentration ranged between 0 and 2.88 ppb, and the mean concentration was 1.36 ppb. The NH3 concentrations were ND. This study indicatd that the ambient air quality of the optoelectronics site area measured in south. The air quality of the area investigated in this research conformed to the peripheral boundary emissions standard of the Stationary Pollution Source Air Pollutant Emissions Standards. (DMS <0.2 ppm, Cl2 <0.02 ppm, NH3 <1 ppm).