TMAH (四甲基氫氧化銨)為光電業及半導體業經常伴隨處理水排出之污染物質進入科學園區之污水處理廠中,本研究將透過長期監測及利用數據分析方式探討了解 TMAH 於科學園區污水處理廠中水質特性。在廠商端放流水監測結果顯示,確實 TMAH 持續且大量的排入後續處理系統中,在污水廠端可發現其出流水氨氮濃度有大於進流水氨氮濃度的現象,推測為降解 TMAH 時所造成之貢獻,且出流水氨氮之濃度隨著 TMAH 進流濃度增加而增加,但在進流濃度高於 150mg/L 時,TMAH的降解將受到抑制。進流水 TMAH 濃度變化與 COD 值並無顯著關係,但與 BOD 的相關性較為明顯,在 TMAH 濃度 200 mg/L 以下時,BOD 的濃度隨之增加而增加,高於 200 mg/L時則反之。TMAH 去除率隨著陰離子界面活性劑濃度增加而降低,陰離子界面活性劑濃度 0.2 mg/L 以下時,TMAH 去除率均有 80%以上,隨著陰離子界面活性劑增加至 1.8 mg/L 時,其去除率降低至 30%。
TMAH (tetramethyl ammonium hydroxide) for the optical industry and the semiconductor industry is often accompanied by the discharge of treated water pollutants into the Science Park sewage treatment plant. This study will explore the long-term monitoring and understanding through the use of data analysis methods TMAH water features in Science Park sewage treatment plant. In the vendor side effluent monitoring results show that a large TMAH into the processing system, The ammonia concentration of wastewater treatment plant effluent greater than the influent ammonia concentration, suggesting that when the contribution is caused by the degradation of TMAH, and the concentration of ammonia in the water inflow increases by TMAH concentration, but in the input stream when concentrations higher than 150mg / L, TMAH degradation will be inhibited.The TMAH’s concentration is no significant correlation between the concentration of COD , but the correlation is more obvious with the BOD.At TMAH’s concentration under 200 mg/L or less, the BOD will be increases by the TMAH’s concentration, which TMAH’s concentration more than 200 mg/L, the BOD will be not. The TMAH removal increases the concentration of the anionic surfactant is reduced, the concentration of anionic surface less than 0.2 mg/L, the removal of TMAH had more than 80%. The concentration of anionic surfactant increased to 1.8 mg/L, the removal rate will be decreased to 30%.