The purpose of this research is to improve the conversion efficiency of a solar cell by using a new antireflection layer. It is expected that the reflectance can be reduced through of a new textured structure. This method integrates a sacrificial amorphous silicon layer with a wet etching process on silicon wafer to form the antireflected structure. There are many fine etched porous structures distributed in the interior of silicon grain. This new texture structure can not only improve the external quantum efficiency of mono-crystalline silicon solar cell by more than 90%, but also alleviate the reflectance of incident light remarkably.