摘要
丙酮是常用於薄膜液晶顯示器與半導體產業之溶劑，也是此產業廢水之主要成份之一。高級氧化法常用在降解工業廢水中的有機化合物，如O3和O3/UV程序。在高級氧化法中主要是利用氫氧自由基去分解有機化合物。 本實驗使用O3和O3/UV程序降解丙酮溶液。實驗中影響丙酮降解的因素包括初始pH值、初始丙酮濃度、臭氧氣體進料流速、反應溫度和UV光強度。結果顯示，丙酮在pH = 11時有較高的去除效果；初始丙酮濃度愈低去除效果越快；丙酮去除效果隨臭氧氣體進料流速增加而增加，UV光強度愈大，酮去除效率愈快。在O3/UV程序，反應溫度愈高，丙酮去除效率愈低。但是在O3程序中反應溫度對丙酮去除效率之影響與丙酮之初始濃度有關。針對O3程序與O3/UV程序我們推導出動力學模式，在不同實驗條件下之實驗數據與模式預測值相當接近。
並列摘要
Acetone, a commonly used solvent in TFT-LCD and semiconductor industries, is one of the major pollutants in the industrial wastewaters. Advanced oxidation processes (AOPs), such as O3 and O3/UV are widely used to decompose organic products in industrial wastewater. In AOP systems, the free radicals (OH‧) are the dominant species contributing to the degradation of organics in wastewater. The study aims at investigating the decomposition efficiencies of acetone by O3 and O3/UV processes under varying experimental conditions such as initial pH, ozone feed flow rate, initial acetone concentration, reaction temperature, and UV light intensity. The experimental results show that the acetone removal efficiencies achieve highest in 120 min reaction time at pH 11 by the O3 and O3/UV processes, respectively. The acetone removal efficiency increases with decreasing initial acetone concentration, increasing ozone feed flow rate, or increasing UV light intensity. For the O3/UV process, the acetone removal efficiency decreases with increasing reaction temperature due to lower ozone solubility. For the O3 process, the effect of reaction temperature on the acetone removal efficiency is also influenced by the initial acetone concentration. Two kinetic models have been developed to correlate the experimental data of the O3 and O3/UV processes. The experimental and the predicted results under different experimental conditions are in fair agreement.