- 學位論文
奈米碳材料的製作、改質及其場發射應用
Fabrication and Modification of Carbon Nano Materials for Electron Field Emission Application
摘要
本論文以碳材料作為電子場發射源，並成功地利用表面處理改善各個電子場發射源之缺點。本實驗使用之兩種電子場發射源分別為奈米碳管、奈米碳片與商用片狀石墨。 我們選擇購買商用片狀石墨粉末並改善其場發射特性。商用片狀石墨粉末的尺寸大小屬微米等級，場發射起始電場約為7.7 V/μm。藉由氫氣熱處理進行表面改質可降低起始電場至4.3 V/μm；若導入乙炔與氫氣進行熱處理，因可成長奈米碳管，故可將起始電場再降低至1.9 V/μm。 本實驗室開發之奈米碳片可由射頻磁控濺鍍法完成，設備成本與製作複雜性低於其他實驗室的化學氣相沉積法。實驗中觀察奈米碳片的形成方式與製程中各參數對於奈米碳片場發射特性與表面形態的影響。我們利用熱處理與披覆處理以改善奈米碳片場發射特性。藉由碳披覆處理可使場發射起始電場由5.8 V/μm大幅降低至2.3 V/μm。此碳披覆處理改善方式可在500 ˚C下進行，可套用於玻璃基板製程。 最後與大同公司和中華映管合作進行場發射背光源的製作，搭配7吋移除CCFL的數位相框並成功地驅動展示。
並列摘要
In the study, the carbon materials form the electron field emitter, and successfully improved by various surface treatments of the defects. Two kinds of electron field emission source of carbon nanoflakes (CNFs) and commercial graphite flake were used in this study. We used commercial graphite flake powder and tried to improve its field emission properties. Commercial flake graphite powder size is micron scale; the turn-on field is about 7.7 V/μm. By the surface modification of hydrogen heat treatment can reduce the turn-on field to 4.3 V/μm. The turn-on field is further reduced to 1.9 V/μm by heat treatment introduced into acetylene and hydrogen, owing to the growth of CNT on above. Developed in the laboratory of the two-dimensional structure of the CNFs, the height and thickness of the CNFs are micron and nano-scale, vertical upright on the substrate. We developed the CNFs by RF magnetron sputtering since the equipment costs and production complexity are lower than the chemical vapor deposition method. Experiment observed the formation of CNFs in the manner and process parameters for the field emission characteristics of CNF and surface morphology. We use heat and drape management to improve field emission properties of CNFs. With carbon-coated treatment makes the field emission from the turn-on field of 5.8 V/μm significantly reduced to 2.3 V/μm. The carbon-coated handle and improve their methods can be carried out under 500 ˚C, and this process can be applied to the glass substrate process. Finally we fabricated the 7-inch field emission backlight unit with Tatung Company and Chunghwa Picture Tubes cooperation and the backlight unit has successfully driven show with 7-inch digital photo frame.