- 學位論文
利用電泳沉積法製作三極式場發射元件
USING ELECTROPHORETIC DEPOSITION TO FABRICATE TRIODE STRUCTURE FIELD EMISSION DEVICE
摘要
本論文主要研究目的為利用製程簡單之電泳沉積法將奈米碳管沉積在ITO玻璃基材上，本研究所用的陽極與陰極基板分別為金電極與ITO電極，在ITO玻璃基板上完成三極式場發射元件，奈米碳管之結構與性質將利用場發射J-E量測系統、拉曼光譜分析(Raman spectroscopy)、場發射掃描式電子顯微鏡(FESEM)加以分析。 本研究主要分為三大部分，第一部份為非直流電泳時沉積之硝酸鎂比例、電壓、頻率與燒結溫度之分析。實驗則使用訊號產生器以及示波器輸出正確之方波脈衝電壓及頻率值。第二部分為利用第一部分所找出最佳參數所做出來的場發射元件上，利用二次電泳的方式電泳沉積二氧化矽於奈米碳管薄膜上。第三部份則為製作場發射顯示光源之元件並完成三極式場發射光源。
並列摘要
In this thesis , we use the electrophoretic deposition (EPD) technique to deposit the carbon nanotubes on the ITO glass substrates . The anode and cathode are gold electrode substrate and ITO electrode substrate, respectively. Using the electrophoretic deposition technique, we complete the triode structure of field emission component on the ITO glass substrate. We use the field emission measurement system, Raman spectroscopy and field emission scanning electron microscopy (FESEM) to analyze the structure of the samples. The way for using electrophoretic deposition technique to fabricate carbon nanotubes field emission cathode is divided into three parts： The first part is the non-DC voltage electrophoresis deposition, and we make analysis in Mg(NO3)2 concentration, voltage, frequency, and sintering temperature. The experiment was performed using a signal generator and the oscilloscope, reading the output of the correct square wave pulse voltage and frequency value . The second part is to use the first part to discover on the field emission component which the best parameter does, using sequential electrophoresis way electrophoretic deposition silicon dioxide on the carbon nanotube thin film . The third part is to use the production of triode structure of field emission component, completing the planar field emission component.