摘要
隨著科技的進步以及時代的演進，個人儲存的需求越來越高，其中光儲存依舊扮演了重要的角色。目前光儲存的目標除了希望儲存容量加大之外，隨著個人化攜帶式的資訊產品蓬勃發展，微小化、輕量化也是發展的重點。為了達到這些目標，必須提升光學讀寫頭的技術，但是以目前的光學讀寫頭技術似乎遇到了難以解決的瓶頸。為了尋求解決之道，本文希望藉由微機電系統技術來達到未來的目標，因為機電技術本身的元件特性就是微小化、輕量化、動態響應快、精準度高、批量製造等等。
本文以光學讀寫頭中致動器的部分為研究目標。在光學讀寫頭當中，需要具備有同平面運動的循軌致動器以及出平面運動的聚焦致動器。本文利用微機電中面型微加工技術以及體型微加工來製造出同平面及出平面大位移致動器。此外，還期望將兩種致動器整合在同一元件上面，並且在致動時能夠獨立操控且互不偶合。並且將光學透鏡整合於微機電元件當中，讓元件擁有光學上的性能。
本文將提出的設計概念主要是利用電磁式致動器以及電熱式致動器來達成致動目標。

關鍵字：光學讀寫頭、微機電系統、微致動器。

目錄
目錄 I
圖目錄 III
第1章 緒論 1
1-1 前言 1
1-2 文獻回顧 2
1-2.1 光學讀寫頭原理 2
1-2.2 微機電元件 4
1-3 研究動機與目標 7
第2章 設計與分析 16
2-1 微型讀寫頭系統設計 16
2-2 出平面聚焦致動器設計 18
2-3 同平面循軌致動器設計 21
第3章 製程步驟與結果 33
3-1 製程步驟 33
3-2 製程結果與討論 35
3-2.1 製程結果 35
3-2.2 製程注意事項討論 36
3-3 製程問題與討論 37
3-3.1 最初製程設計問題 37
3-3.2 SOI晶片絕緣層應力問題 38
3-3.3 元件釋放問題 38
3-3.4 UV膠透鏡問題 39
第4章 實驗架設與元件測試 55
4-1 實驗架設 55
4-2 出平面聚焦致動量測 55
4-3 同平面循軌致動量測 57
4-4 光學量測 58
第5章 結論 70
5-1 結論與本文貢獻 70
5-2 未來工作 71
第6章 參考文獻 75


圖目錄
圖1-1 光碟機系統示意圖 9
圖1-2 光學讀寫頭的示意圖 9
圖1-3光碟規格圖表 10
圖1-4 傳統四弦型(4-Wire)光學讀寫頭 11
圖1-5 Ty Harness的雙軸致動器 11
圖1-6 M. Helmbrecht微面鏡 12
圖1-7 Kwang-Cheol Lee雙軸致動平台 12
圖1-8 Wen-Chih Chen出平面熱致動器 12
圖1-9 Jack W. Judy同平面磁致動結構 13
圖1-10 Chang Liu 出平面面型加工磁致動平板 13
圖1-11 Seiichi Hata光碟機飛行讀寫頭聚焦平台 14
圖1-12 M. Wu微光學桌 14
圖1-13 雙階段調整系統架設示意圖 15
圖1-14 微機電元件系統架設示意圖 15
圖2-1 系統設計概念示意圖 24
圖2-2 元件設計概念示意圖 24
圖2-3 聚焦致動頻率響應圖模擬 25
圖2-4 循軌致動頻率響應圖模擬 26
圖2-5 聚焦致動原理示意圖 27
圖2-6 電磁致動示意圖 27
圖2-7 元件上視圖 28
圖2-8 雙層金屬導線側視圖 28
圖2-9 不同聚焦致動彈簧模擬結果 29
圖2-10 V型彎曲臂熱致動器 29
圖2-11 V型彎曲臂熱致動器設計可調變幾何參數 29
圖2-12 循軌致動器模擬結果 30
圖2-13 聚焦致動造成循軌致動器變形模擬 31
圖2-14 聚焦致動造成循軌致動器變形模擬 31
圖2-15 兩對V型彎曲臂模擬結果 32
圖3-1製作流程圖 40
圖3-1製作流程圖(續) 41
圖3-1製作流程圖(續) 42
圖3-2整合聚焦透鏡步驟 42
圖3-3 製程步驟到達圖(3-1d)時結果 43
圖3-4 第一層金屬導線 43
圖3-5 第一層金屬導線與定義完圖案的氮化矽層 44
圖3-6 SOI晶片正面蝕刻結果 44
圖3-7 大尺寸雙向循軌致動元件 45
圖3-8 小尺寸雙向循軌致動元件 45
圖3-9 循軌致動器(V-beam thermal actuator) 46
圖3-10 聚焦致動元件陣列 46
圖3-11 聚焦致動元件 47
圖3-12 雙層導線平面線圈 47
圖3-13 聚焦循軌致動元件 48
圖3-14 整合商用聚焦物鏡之元件 48
圖3-15 商用聚焦物鏡之近拍 49
圖3-16 整合UV膠透鏡之元件 49
圖3-17 第一層電鍍銅導線脫層 50
圖3-18 第一層電鍍銅導線脫層與氧化 50
圖3-19 第二層電鍍銅導線脫層 51
圖3-20 SOI晶片氧化層應力造成氧化層波紋 51
圖3-21 SOI晶片氧化層破裂 52
圖3-22 氧化層應力造成元件變形 52
圖3-23 氧化層應力造成元件破壞 53
圖3-24 第二層鋁導線脫離 53
圖3-25 UV膠灘流 54
圖4-1 聚焦致動量測架設示意圖 59
圖4-2聚焦致動量測架設圖 59
圖4-3 循軌致動量測架設示意圖 60
圖4-4 聚焦致動位移量 60
圖4-5 聚焦致動頻率響應圖 61
圖4-6 聚焦致動頻率響應實驗與模擬(製程前模擬)比較 62
圖4-7 聚焦致動頻率響應實驗與模擬(製程後模擬)比較 62
圖4-8 大位移元件聚焦致動位移量 63
圖4-9 大位移聚焦元件致動頻率響應圖 63
圖4-10 V-beam thermal actuator，(a)致動前，(b)致動後 64
圖4-11 單向循軌致動位移量 64
圖4-12 循軌致動頻率響應圖 65
圖4-13 循軌致動頻率響應實驗與模擬(製程前模擬)比較 66
圖4-14 循軌致動頻率響應實驗與模擬(製程後模擬)比較 66
圖4-15 大位移元件循軌致動位移量 67
圖4-16 光路架設示意圖 67
圖4-17 實際光路架設圖 68
圖4-18光路架設後元件圖 68
圖4-19 透鏡聚焦效果，(a)光線離焦，(b)光線聚焦 69
圖5-1元件規格比較表 72
圖5-2 商用讀寫頭致動部件與微機電元件 73
圖5-3 雙階段調整平台示意圖 73
圖5-4 光纖定位架構圖 74
圖5-5 定位元件與光纖近拍圖 74

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