本論文主要是探討氮化鈦鋯(Ti,Zr)N經由微結構的變化進而引響薄膜性質之研究。氮化鈦鋯薄膜使用雙靶射頻磁控濺鍍技術，並依據之前氮化鈦及氮化鋯薄膜研究所得之最佳參數法製鍍。經由調變靶材功率、基板偏壓、氮氣流量等實驗參數的所產生不同結構變化，進而影響到(Ti,Zr)N薄膜電阻率、硬度等性質。在所形成的薄膜中，有兩種狀況需要考慮，分別是單相的(Ti,Zr)N薄膜與 (Ti,Zr)N薄膜中有包含TiZr結晶相的情況。X光繞射圖形顯示(Ti,Zr)N之(111)繞射峰會出現在TiN (111)及Zr N (111)繞射峰之間，(Ti,Zr)N之(200)繞射峰會出現在TiN (200)及ZrN (200)繞射峰之間。經由X光繞射圖形所計算出來的晶粒大小都小於20 nm，掃描式電子顯微鏡與原子力顯微鏡分析結果也都顯示出相同的晶粒大小。所有試片的薄膜厚度隨著靶材功率增加、降低基板偏壓與降低氮氣流量降低而增加。薄膜電阻率與堆積因子成反比；硬度與晶粒大小成反比，且當(Ti,Zr)N薄膜優選方向為(111)取向時有35.5 GPa ~ 37.5 GPa的高硬度。利用動態極化掃描從-800 V掃到 800 V的實驗結果顯示添加Zr可以有效提昇TiN的腐蝕抗性。

Contents 5
Figures Caption 7
Tables Caption 10
Chapter 1 Introduction 11
Chapter 2 Literature Review 13
2.1. Coating Processes 13
2.2 Characteristics of TiN and ZrN 17
2.2.1 Microstructure of TiN and ZrN 22
2.2.2 Properties of TiN and ZrN 26
2.3 Nanograin and Nanocomposite of Nanostructured materials 29
2.3.1 Nanograin of Nanostructured material 30
2.3.2 Nanocomposite of Nanostructured material 32
2.4 Characteristics of TiAlN 33
2.4.1 Microstructure Ti1-xAlxN films 35
2.4.2 Properties of TiAlN 36
2.4.3 Superhardness nc-TiAlN/AlN nanocomposite films 39
2.4.4 Spinoidal decomposition in TiAlN 40
2.5 Characteristics of TiZrN 42
2.5.1 Microstructure Ti1-xZrxN films 42
2.5.2 Properties of TiZrN 44
2.5.3 Spinoidal decomposition in TiZrN 46
2.6 Characteristics of TiZr 48
Chapter 3 Experimental Details 50
3.1 Experimental Apparatus and Specimen Preparation 50
3.2 Structural Characterization 55
3.2.1 X-ray diffraction 55
3.2.2 Rutherford backscattering spectrometer 56
3.2.3 Scanning electron microscopy 57
3.2.4 Atomic force microscopy 58
3.2.5 Auger electron spectrometer 59
3.3 Properties Measurements 61
3.3.1 Four-point probe 61
3.3.2 Nanoidentation 63
3.3.3 Residual Stress 66
3.3.4 Corrosion Resistance 68
Chapter 4 Results 71
4.1 Structure and properties of (Ti,Zr)N with variety ratio of Zr/(Zr+Ti) 71
4.1.1 Microstructure of (Ti,Zr)N films 74
4.1.2 Properties of (Ti,Zr)N films 76
4.2 Ion bombardment influence during deposition process 81
4.2.1 Microstructure of (Ti,Zr)N films with negative substrate bias 83
4.2.2 Properties of (Ti,Zr)N films with negative substrate bias 96
4.3 Effect of different nitrogen flow rate 101
4.3.1 Microstructure of (Ti,Zr)Ny films 103
4.3.2 Properties of (Ti,Zr)Ny films 109
Chapter 5 Discussion 112
5.1 Microstructure of (Ti,Zr)N films 113
5.2 Properties of (Ti,Zr)N films 117
Chapter 6 Conclusions 125
References 126

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