|
Chapter 1 Reference
[1] S. T. Sheppard, K. Doverspike, W. L. Pribble, S. T. Allen, J. W. Palmour, L. T. Kehias, and T. J. Jenkins, IEEE Electron Device Lett. 20, 161 (1999).
[2] P. D. Ye, B. Yang, K. K. Ng, J. Bude, G. D. Wilk, S. Halder, and J. C. M. Hwang, Appl. Phys. Lett. 86, 063501 (2005).
[3] M. Higashiwaki, T. Matsui, and T. Mimura, IEEE Electron Device Lett. 27, 16 (2006).
[4] B. Gelmont, K. Kim, and M. Shur, J. Appl. Phys. 74, 1818 (1993).
[5] T. P. Chow, Proc. Mater. Res.Soc. Spring Meeting 622, T1.1.1 (2000).
[6] W. Huang, T. Khan, and T. P. Chow, IEEE Electron Device Lett. 27, 796 (2006).
[7] H. B. Lee, H. I. Cho, H. S. An, Y. H. Bae, M. B. Lee, J. H. Lee, and S. H. Hahm, IEEE Electron Device Lett. 27, 81 (2006).
[8] M. Hong, K. A. Anselm, J. P. Mannaerts, J. Kwo, A. Y. Cho, A. R. Kortan, C. M. Lee, J. I. Chyi, and T. S. Lay, J. Vac. Sci. Technol. B 18, 1453 (2000).
[9] Y.C. Chang, Y.J. Lee, Y.N. Chiu, T.D. Lin, S.Y. Wu, H.C. Chiu, J. Kwo, Y.H. Wang, and M. Hong, J. Cryst. Growth 301-302, 390 (2007).
[10] P. D. Ye, B. Yang, K. K. Ng, J. Bude, G. D. Wilk, S. Halder, and J. C. M. Hwang, Appl. Phys. Lett. 86, 063501 (2005).
[11] Y. Q. Wu, P. D. Ye, G. D. Wilk, and B. Yang, Mater. Sci. Eng. B 135, 282 (2006).
[12] Y. Irokawa, Y. Nakano, M. Ishiko, T. Kachi, J. Kim, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, C. C. Pan, G. T. Chen, and J. I. Chyi, Appl. Phys. Lett. 84, 2919 (2004).
[13] J. Kim, R. Mehandru, B. Luo, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, and Y. Irokawa, Appl. Phys. Lett. 80, 4555 (2002).
[14] Y. C. Chang, H. C. Chiu, Y. J. Lee, M. L. Huang, K. Y. Lee, M. Hong, Y. N. Chiu, J. Kwo, and Y. H. Wang, Appl. Phys. Lett. 90, 232904 (2007).
[15] W. H. Chang, C. H. Lee, P. Chang, Y. C. Chang, Y. J. Lee, J. Kwo, C. C. Tsai, J.M. Hong, C.H. Hsu and M. Hong , Journal of Crystal Growth, 311, (2009), 2183
[16] Hong M, Kwo J, Chu SNG, Mannaerts JP, Kortan AR, Ng HM, Cho AY, Anselm KA, Lee CM, Chyi JI, J. Vac. Sci. Technol. B 20, 1274 (2002)
[17] B. P. Gila1, J. W. Johnson, R. Mehandru, B. Luo, A. H. Onstine, K. K. Allums, V. Krishnamoorthy, S. Bates, C.R. Abernathy,F. Ren, and S.J. Pearton, phys. stat. sol. (a) 188, No. 1, 239–242 (2001)
[18] Foex, M.; Traverse, J. P. Rev. Int. Hautes Temp. Re´fract. 1966,3, 429.
[19] Gin-ya Adachi and Nobuhito Imanaka Chem. Rev. 1998, 98, 1479-1514
[20] Matvei Zinkevich, Materials Science 52 (2007) 597–647
[21] J. Kwo, M. Hong, A. R. Kortan, K. L. Queeney, Y. J. Chabal, J. P. Mannaerts, T. Boone, J. J. Krajewski, A. M. Sergnt and J. M. Rosamilia, Appl. Phys. Lett. 77, 130 (2000)
[22] J. Kwo, M. Hong, A. R. Kortan, K. L. Queeney, Y. J. Chabal, R. L. Opila. Jr., D. A. Muller, S. N. G. Chu, B. J. Sapjeta, T. S. Lay, J. P. Mannaerts, T. Boone, H. W. Krautter, J. J. Krajewski, A. M. Sergnt and J. M. Rosamilia, J. Appl. Phys. 89, 3920 (2001)
[23] Y. J. Lee, W. C. Lee, C. W. Nieh, Z. K. Yang, A. R. Kortan, M. Hong, J. Kwo and C.-H. Hsu, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 26, 1124-1127 (2008)
[24] C. W. Nieh, Y. J. Lee, W. C. Lee, Z. K. Yang, A. R. L Kortan, M. Hong, J. Kwo and C. H. Hsu, , Appl. Phys. Lett. 92 ,061914 ,(2008)
[25] P. Chang, M. Hong and J. Kwo (unpublished results)
Chapter 2 Reference
[1] M. Hong, M. Passlack, J. P. Mannaerts, J. Kwo, S. N. G. Chu, N. Moriya, S. Y. Hou and V. J. Fratello, J. Vac. Sci. Technol. B 14, 2297 (1996)
[2] M. A. Herman, H. Sitter, Molecular Beam Epitaxy- Fundamentals and Current Status, Springer-Verlag Berlin Heidelberg 1989
[3] J. Als-Nielsen, Des McMorro, “Elements of Modern X-Ray Physics”, (Wiley& Sons , New York, 2001).
[4] Azaroff L V, Kaplow R, Kato N, Weiss R J, Wilson A J C and Young R A, X-ray Diffraction (International Series in Pure and Applied Physics) (New York: Wiley), 1974 [5] Babkevich A Yu, Cowley R A, Mason N J, Sandiford S and Stunault A, J. Phys.: Condens. Matter 14, 7101 (2002)
[6] B. E. Warren, and B. L. Averbach, J. Appl. Phys. 21, 595 (1950). [27] G. K. Williamson, and W.H. Hall, Acta Metal. 1, 22 (1953).
[7] G. K. Williamson, and W.H. Hall, Acta Metal. 1, 22 (1953).
[8] L. H. Schwartz, and J. B. Cohen, “ Diffraction from Materials, 2nd ed.” Springer- Verlag, Berlin, (1987).
[9] Feng Huang, X-ray Reflectivity Studies on Thin Films (2005)
[10] D. B. Wiliams and C. B. Carter, “Transmission Electron Microsdopy” Plenum Press, New York, (1996).
[11] C. O. Dunn, and E. F. Koch, Acta metall. 5, 548 (1957).
[12]. Donald A. Neamen, “Semiconductor physics and devices : basic principles", McGraw-Hill, 2003
[13] DIETER K. SCHRODER, “semiconductor material and device characterization”, Wiley
[14] YUAN TAUR and TAK H. NING,Fndamentals of Modern VLSI Devices, CAMBRIDGE(2002)
Chapter 3 Reference
[1] M. Hong, M. Passlack, J. P. Mannaerts, J. Kwo, S. N. G. Chu, N. Moriya, S. Y. Hou and V. J. Fratello, J. Vac. Sci. Technol. B 14, 2297 (1996)
Chapter 4 Reference
[1] W. H. Chang, C. H. Lee, P. Chang, Y. C. Chang, Y. J. Lee, J. Kwo, C. C. Tsai, J.M. Hong, C.H. Hsu and M. Hong , Journal of Crystal Growth, 311, (2009), 2183
[2] L. Tapfer, W. Stolz, K.H. Ploog, J. Appl. Phys. 66 (1989) 3217.
[3] Bo Wua, Matvei Zinkevich, Fritz Aldinger, Dingzhong Wen, Lu Chen, Journal of Solid State Chemistry 180 (2007) 3280–3287
[4] C.H Lee, thesis (2008) “Structural investigation of monoclinic phase Gd2O3 epitaxially grown on GaN(0001) by MBE”
[5] Matvei Zinkevich, Materials Science 52 (2007) 597–647
[6] Handbook on the Physics and Chemistry of rare earth, CH44 edited by K.A. Gschneidner, Jr. and L. Eyring, (1982)
[7] F. X. Zhang, M. Lang, J. W. Wang, U. Becker, and R. C. Ewing, PHYSICAL REVIEW B 78, 064114 (2008)
[8] Alessandro Molle, Claudia Wiemer, Md. Nurul Kabir Bhuiyan, Grazia Tallarida, and Marco Fanciulli, Appl. Phys. Lett. 90, 193511 (2007)
[9] J. Kwo, M. Hong, A. R. Kortan, K. L. Queeney, Y. J. Chabal, J. P. Mannaerts, T. Boone, J. J. Krajewski, A. M. Sergnt and J. M. Rosamilia, Appl. Phys. Lett. 77, 130 (2000)
[10] J. Kwo, M. Hong, A. R. Kortan, K. L. Queeney, Y. J. Chabal, R. L. Opila. Jr., D. A. Muller, S. N. G. Chu, B. J. Sapjeta, T. S. Lay, J. P. Mannaerts, T. Boone, H. W. Krautter, J. J. Krajewski, A. M. Sergnt and J. M. Rosamilia, J. Appl. Phys. 89, 3920 (2001)
[11] Y. J. Lee, W. C. Lee, C. W. Nieh, Z. K. Yang, A. R. Kortan, M. Hong, J. Kwo and C.-H. Hsu, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 26, 1124-1127 (2008)
[12] C. W. Nieh, Y. J. Lee, W. C. Lee, Z. K. Yang, A. R. L Kortan, M. Hong, J. Kwo and C. H. Hsu, , Appl. Phys. Lett. 92 ,061914 ,(2008)
[13] P Chang, M. Hong and J. Kwo (unpublished results)
[14] D. K. Bowen and B. K. Tanner, Nanotechnology,4,175 (1993).
[15] Roth, R. S., Phase Equilibria Diagrams: Phase Diagrams for Ceramics, Vol XI. The American Ceramic Society, Westville, OH, 1995, p. 107.
[16] M. Medraj, R. Hammond, M.A. Parvez, R.A.L. Drew and W.T. Thompson, Journal of the European Ceramic Society 26 (2006) 3515–3524
[17] K. Tomida, K. Kita, and A. Toriumi, Appl. Phys. Lett. 2006, 89, 142902
|