|
參考文獻 1.Steven M.D., Hotchkiss J.H., Packag. Technol. Sci. 15 (2002) 17. 2.Lee J.H., Jeong C.H., et al., Surf. Coat. Technol. 200 (2005) 680. 3.Burrows P.E., V. Bulovic, S.R. Forrest, Appl. Phys. Lett. 65 (1994) 2922. 4.N. Schiller, S. Straach, et al., Proceeding of Society of Vacuum Coaters 44 Annual Technical Conference, 2001, p. 184. 5.Burrows P.E., G.L. Graff, M.E. Gross, et al., Displays 22 (2001) 65. 6.M.R. Pennel, Presentation in Plastic Electronics Conference, Frankfurt, 2005. 7.G.L. Czeremuszkin, M.R. Wertheimer, A.S. Da Sibringo, Plasmas Polym. 6 (2001) 107. 8.E.M. Liston, L. Martinu, M. R. Wertheimer, J. Adhes. Sci. Technol. 7 (1993) 1091. 9.張秋萍,黃天恆,化工資訊與商情,第18期,2004。 10.Bichler C, Kerbstadt T, Langowski H. C., et al., Surf. Coat. Technol. 97 (1997) 299. 11.Feng T., X. Wang, F.M. Zhang, et al., Int. J. Mod. Phys. B16 (2002) 1052. 12.Teshima K., H. Sugimura, Y. Inoue, et al., Langmuir 19 (2003) 8331. 13.Gao D., K. Urukawa, H. Nakashima, et al., Jpn. J. Appl. Phys. 38 (1999) 4868. 14.Walther M., M. Heming, M. Spallek, Surf. Coat. Technol. 80 (1996) 200. 15.K. Muraoka, C. Honda, K. Uchino, et al., Plasma Source Sci. Technol. 3 (1994) 473. 16.Brake M. L., HInkle J., Asmussen J., et al., J. Plasma Chem. Plasma Process 3 (1983) 63. 17.Michael A. Lieberman, Richard A. Gottsho, Phusics of thin films 18 (1994). 18.潘彥儒博士論文,微波激發同軸慢波結構線型表面波電漿源之研究,2009年七月。 19.G.F. Leu, A. brockhaus, J. Engemann, Surf. Coat. Technol. 174-175(2003) 928. 20.S. Zarrabian, C. Lee, K. H. Guenther, Applied Optics 32 (1993) 5606. 21.J.C. Vickeaman, Surface Analysis- The Principal Techniques, Wiley, New York, 1997. 22.G. Socrates, Infrared and Raman Characteristic Group Frequencies: Tables and Charts 3rd Edition, Wiley, New York, 2001. 23.J. R. Roth, Industrial Plasma Engineering, Vol. 2, Institute of physics Publishing, Bristol, 2001. 24.J. Robert, J. Adhes. Sci. Technol. 6 (1992) 1269. 25.R.S. Kumar, Mark Auch, Eric Ou, et al., Thin Solid Films 417 (2002) 120.
|