直流濺鍍氧化鎢薄膜結構及電致變色特性分析

The Deposition, Microstructure and Electrochromism of Tungsten Oxide Films by DC Sputtering

李泉(Chuan Li) ； 黃柏欽(B. Q. Huang)

《真空科技》 27卷3期 (2014/09) Pp. 12-21

摘要

本實驗使用直流濺鍍製程鍍製在不同氧流量下的氧化鎢薄膜。在鍍膜過程中，使用OES監控濺鍍製程。鍍膜後使用XRD、SEM、拉曼光譜儀, 紫外光／可見光分光光譜儀分別分析薄膜的結構組成、化學成分、表面形態及光學性質。實驗結果顯示在低氧流量參數下（5 sccm），會形成了富含高比例金屬鎢的氧化鎢薄膜，隨著氧流量增加（10-20 sccm），薄膜逐漸形成非晶態的氧化鎢。從XRD的數據中得知，所有不同參數下的氧化鎢薄膜皆為非晶態，從SEM的結果裡發現隨著氧流量增加，薄膜表面粗糙度隨之下降。從紫外光／可見光分光光譜的分析結果得知，隨著氧流量增加，鍍製的薄膜顏色從低氧流量下的深藍色，逐漸變成透明態的氧化鎢薄膜。為了測試氧化鎢薄膜電致變色的性質，採用電化學的循環伏安法使鋰離子與電子進入氧化鎢薄膜中，使其達到變色的效果。此實驗成功鍍製出具有電致變色功能的氧化鎢薄膜，並透過循環測試法證明薄膜具有透明與深藍兩種狀態反覆變色的功能。

關鍵字

氧化鎢薄膜 ； 電致變色 ； 循環伏安法

並列摘要

Tungsten oxide film under different oxygen flow rates are deposited by DC sputtering. The deposition process is monitored by the optical emission spectrometer. In order to assess the structures, chemical compositions, surface morphology and optical properties of deposited films, the following tools were employed to analyze the deposited films: XRD, SEM, Raman and UV-Vis-NIR spectroscopy. Results show that the deposited films were found to be metal-rich tungsten oxides at low oxygen flow rate (5 sccm) while the films change to amorphous WO_3 at higher oxygen flow rate (10-20 sccm). More specific information from XRD indicates that the all films maintain their amorphousness under different oxygen flow rate. The surface roughness from SEM is reduced as oxygen flow rates increases. For the optical properties, the color of deposited films changes from dark blue at low oxygen flow rates to totally transparent at higher rates, which is quantitatively evaluated by the UVVis- NIR spectroscopy. To further test the electrochromic function of deposited films, we first electrochemically inserted ions (Li^+) and electrons into WO_3 films and then test the color change by cyclic voltammetry. The WO_3 films successfully demonstrated the capability of switch between colored and bleach states during the cyclic test.

並列關鍵字

tungsten oxide films ； OES ； electrochromic ； cyclic voltammetry