- 期刊
多元氮化鋁鉻矽鈦釩AlCrSiTiVN硬質鍍膜之高溫氧化特性
High Temperature Oxidation Resistance of AlCrSiTiVN Multicomponent Coatings
摘要
氮化鉻鋁矽與氮化釩鈦硬質鍍膜與相關之奈米多層薄膜因具備良好機械性質與耐磨耗特性而應用於機械加工與模具成形領域。本研究使用陰極電弧蒸鍍系統，靶材選用鈦合金靶、鋁鉻矽合金靶以及鈦釩合金靶，控制不同陰極靶的輸出電流與功率，以高純度氮氣作為反應氣體製備AlCrSiN/TiVN奈米多層薄膜，利用TiN作為中介層藉以增加薄膜與基材間的附著性。本研究探討鍍膜之高溫氧化特性，於高溫氧化退火利用管型爐將薄膜試片置於空氣中二小時，分別在500度與700度進行高溫氧化試驗。研究結果顯示以相同鋁鉻矽合金靶以及鈦釩合金靶之靶電流（70A/70A）所製備的AlCrSi-TiVN-1硬質薄膜在常溫時擁有最高的硬度值32.87 GPa。AlCrSiTiVN硬質薄膜高溫氧化後會在薄膜表面因高溫氧化擴散形成氧化層結構，薄膜之鋁含量會影響到薄膜熱穩定性，研究顯示鋁含量最高的AlCrSiTiVN-0.5（TiV/AlCrSi靶電流比例為50 A/95 A）薄膜具有最好的抗氧化性，薄膜中之鋁成分傾向擴散於薄膜表面而形成具化學穩定性之緻密氧化鋁，阻礙進一步之氧擴散至薄膜內部。
並列摘要
Multicomponent coatings have been replaced by ordinary binary transition metal nitrides, by adding other types of elements to form a ternary and quaternary alloy nitride, have been widely used in machinery, semiconductor components and automotive parts. In this study, AlCrSi- TiVN multicomponent coatings were deposited using a cathodic arc deposition system. Ti_(60)V_(40) and Cr_(60)Al_(30)Si_(10) cathodes were used for the deposition of AlCrSiTiV multicomponent coatings. By controlling the Ti_(60)V_(40) and Cr_(60)Al_(30)Si_(10) cathode current ratio, the microstructure and composition of the AlCrSiTiVN coatings were changed. The results showed that the AlCrSiTiVN-1 film with equal caothde currents of Ti_(60)V_(40) and Cr_(60)Al_(30)Si_(10) cathodes had the highest hardness of 33 GPa due to the smallest grain size 13.2nm. From the XRD analyses, AlCrSiTiVN films had fcc-NaCl structure, vanadium pentoxide (V_2O_5 ) were formed after annealing at 500˚C. AlCrSiTiVN-0.5 film with the highest Al contents had the best thermal oxidation resistance. Al_2O_3、VO_2、AlVO_4 and V_2O_5 were formed after annealing at 700˚C.