以脈衝直流磁控濺鍍技術製備含鈦類鑽碳薄膜之研究

Deposition of Titanium-containing Diamond-like Carbon Films by Pulsed DC Magnetron Sputtering Process

張奇龍(Chi-Lung Chang) ； 王謹銘(Jin-Ming Wang) ； 陳品宏(Pin-Hung Chen) ； 陳威池(Wei-Chih Chen) ； 汪大永(Da-Yung Wang) ； 吳宛玉(Wan-Yu Wu)

《真空科技》 27卷3期 (2014/09) Pp. 47-55

摘要

本研究中利用金屬鈦靶與碳靶於氬氣氣氛下，以脈衝直流濺鍍技術沉積含鈦類鑽碳薄膜。其中基板以旋轉的方式交替面對兩個磁控濺鍍陰極，並以改變石墨靶陰極之脈衝功率與脈衝周期進行討論。結果顯示電漿瞬間功率、薄膜沉積速度、薄膜表面粗糙度與硬度皆明顯受石墨靶材脈衝功率影響。且由拉曼分析結果發現，I_D/I_G較低之含鈦類鑽碳薄膜具有較高之硬度值。研究中所沉積之薄膜硬度與彈性模數範圍分別為11-15 GPa與121-169 GPa。此外，由大氣環境下室溫及高溫的磨耗分析發現，以脈衝直流磁控濺鍍製備之含鈦類鑽碳薄膜較傳統直流磁控濺鍍所得之含鈦類鑽碳薄膜具有明顯較低之摩擦係數。

關鍵字

含鈦類鑽碳薄膜 ； 脈衝直流磁控濺鍍技術 ； 拉曼分析 ； 硬度 ； 摩擦係數

並列摘要

In this study, titanium-containing diamond-like carbon (Ti-DLC) films were deposited by pulsed direct current magnetron sputtering (dcMS) in an argon atmosphere using graphite and titanium targets. The substrate was rotated between the two facing magnetron cathodes while different powers and pulse durations were applied to the graphite target. The results indicate that the plasma, peak power, deposition rate, surface roughness, and hardness were strongly affected by the pulse power of C target. The bonding properties of Ti-DLC films were characterized by micro-Raman and the result shows a lower I_D/I_G ratio leading to higher hardness. The hardness and elastic modulus are in the range of 11-15 GPa and 121-169 GPa, respectively. Friction coefficient of Ti-DLC films was measured using a rotating type ball-on-disk apparatus in ambient condition at room and high temperatures. The results reveal that the Ti-DLC films prepared by pulsed dcMS have a much lower friction coefficient than that by conventional dcMS.

並列關鍵字

titanium-containing diamond-like carbon (Ti-DLC) ； Pulsed DC Magnetron Sputtering ； Raman ； hardness ； friction coefficient