掃描探針顯微術於光電檢測之機制

Mechanisms of Scanning Probe Microscopy in Electro-Optical Analysis

林宇軒(Yu-Hsuan Lin) ； 蘇健穎(Chien-Ying Su) ； 潘漢昌(Han-Chang Pan) ； 蕭銘華(Ming-Hua Shiao)

《科儀新知》 146期 (2005/06) Pp. 52-62

https://doi.org/10.29662/IT.200506.0006

摘要

掃描探針顯微術於奈米表面檢測技術佔有關鍵性地位，是產業界與學術界頗受重視的檢測分析技術之一。掃描探針顯微術具備原子級解析度，同時可檢測材料表面光學、電學、磁學與力學等多種微觀特性。其中掃描近場光學顯微術突破了傳統光學繞射極限的解析限制，而導電性原子力顯微術則提供表面電性的統計分析，無論在物理、化學、材料科學與生物等領域都有廣泛的應用。本文將介紹由國家實驗研究院儀器科技研究中心自行改裝自一般原子力顯微儀的這兩項技術及其基本原理、系統架設與應用。

並列摘要

Scanning probe microscopy is a key technology of nanometer-scale surface analysis, and highly valued among industries and academia. Scanning probe microscopy with atomic resolution can be used to measure the optical, electrical, magnetic, mechanical and many more other properties of the material surface. Near-field scanning optical microscopy breaks through the diffraction limit of conventional optical resolution, and conducting atomic force microscopy provides statistical analysis of surface electrical properties. They are extensively applied in the fields of physics, chemistry, material science and biology. The basic principles, system setup and applications of these two technologies that are upgraded from ordinary atomic force microscopes at ITRC (Instrument Technology Research Center) are introduced in this article.