Epoxy/ZnSb2O6的有機／無機抗靜電奈米光學複合材料合成與其性質之研究

本實驗主要在探討環氧樹脂奈米複合材料作為耐熱、透明及抗靜電光學薄膜與封裝材料之製備與性能研究，首先以含環氧基矽氧烷(Glycidoxypropyltrimethoxysilane, GPS)作為偶合劑，將奈米級二氧化矽(Colloid silica)原料進行表面經有機化改質，以紅外線光譜儀(FT-IR)鑑定鍵結情形，接著利用苯均四羧基二酸酐(Pyromellitic dianhydride, PMDA)作為交聯劑，合成出環氧樹脂/SiO2奈米複合薄膜，再加入不同比例的奈米級(15nm)氧化鋅銻(Colloid ZnSb2O6)抗靜電試劑，以得到環氧樹脂／SiO2/ZnSb2O6奈米抗靜電複合光學薄膜，並進行耐熱性、透光性、表面電阻與薄膜結構檢測分析。根據TGA結果可知，以GPS/ Colloid silica溶液重量比例1:1.1製備而成的環氧樹脂／SiO2奈米複合薄膜，Td在388~396℃之間，硬度均達到8-9H，光穿透度均高於95%，而環氧樹脂/SiO2/ZnSb2O6奈米抗靜電複合薄膜Td在345~375℃之間，氧化鋅銻固含量在20%以下時，光穿透度均高於80%，其表面電阻約10^6~10^9Ω/平方公分，均達到抗靜電標準，此奈米光學薄膜經SEM檢測結果確認無機微粒均勻分布且其平均粒徑小於100 nm。由以上結果顯示：本實驗合成之光學薄膜具有應用於光電元件連接、封裝與抗靜電保護之應用價值。

關鍵字

環氧樹脂；奈米二氧化矽；環氧基矽氧烷；抗靜電；奈米複合材料

並列摘要

This research mainly synthesizes a new epoxy/SiO2/ZnSb2O6 nanocomposite materials which can form a thermal resistant, highly transparent and anti-electrostatic thin film. Firstly, the Glycidoxypropyl-trimethoxysilane (GPS) is taken as a coupling agent to perform organic modification on the surface of colloid silica nano-particle and investigated bonding condition with FT-IR spectrum. After that, the pyromellitic dianhydride (PMDA) is used as crosslinking agent to synthesize the epoxy/SiO2 nano-composite thin film and added with a different portion of colloid ZnSb2O6 to obtain the epoxy/SiO2/ZnSb2O6 nano anti-electrostatic optical thin film. The thermal stability, transparency, surface resistance, and morphology structure are investigated. According to the results of TGA, the thermal decomposition temperatures (Td) of epoxy/SiO2 nano-composites that synthesized with GPS/colloid silica solution at a weight ratio of 1:1.1 are between 388~396℃. The hardness of these composites has reached 8-9H and the light transparencies are greater than 95%. Besides, the Td of epoxy/SiO2/ZnSb2O6 anti-electrostatic nano-composite is between 345~375℃, the light transparencies are greater than 80% when the content of ZnSb2O6 is below 20%, and the surface resistance is approximately 10^6~10^9Ω/cm^2, which reaches anti-electrostatic standards. According to the morphology structure which is estimated by FE-SEM, the optic thin films are evenly distributed with inorganic particles and the average particle size of the composite is approximately under 100 nm. The connection to optical element, packaging, and anti-electrostatic protection of these epoxy/SiO2/ZnSb2O6 optical thin films are estimated.