奈米粉體製程環境微粒監測與口罩濾材過濾效率評估

Environmental Particle Monitoring and Respirator Filtration Efficiency Evaluation for Nanopowder Manufacturing Processes

簡弘民(Hung-Min Chein) ； 黃俊超(Chun-Chao Huang) ； 陳姿名(Tzu-Ming Chen) ； 陳光宇(Eddy Kunag-Yu Chen) ； 徐禮業(Li-Yeh Hsu) ； 陳聖遠(Sheng-Yuan Chen)

《勞工安全衛生研究季刊》 14卷2期 (2006/06) Pp. 97-107

https://doi.org/10.7005/JOSH.200606.0097

摘要

本研究針對小型量產的「直流電漿熱反應製造奈米粉體製程」與「微波電漿反應製造奈米粉體製程」進行奈米微粒之作業環境暴露評估，針對製程機台在停機與運轉的狀態下監測其奈米微粒之情況，發現運轉時兩製程環境奈米微粒平均數目濃度分別為25255±4705與22774±3672 #/立方公分，而停機時則分別為14071±995與9918±1546 #/立方公分左右。同時也對「工研院環境奈米實驗室」與「大氣環境」的奈米微粒進行監測，其平均數目濃度分別為11966±2332與22756±3642 #/立方公分。研究中亦針對市售口罩隨機採樣並進行防護效率的測試，測試結果為R95、N95、P100以及Gas filter & P100四種濾材對於奈米微粒的削減有很大的功效。以吸入體內之濃度來看，若使用Gas Filter、Surgical Mask及Active Carbon Mask這三種濾材，操作人員每分鐘仍可吸入總數高達8×10^7~1.59×10^8 #/min的微粒，如使用R95、N95、P100以及Gas filter & P100四種濾材，則吸入之總濃度則可下將至5.09×10^6~1.15×10^7 #/min。針對這兩個製程之操作人員建議以N95或R95以上等級的拋棄式口罩作為個人防護具。

關鍵字

電漿製程 ； 奈米微粒 ； 作業環境 ； 暴露評估

並列摘要

This research focused on the exposure evaluation of the working environment of two small-scale plasma nanopodwer manufacturing processes, the Direct-Current Plasma Nanopowder Process (the direct-current process) and the Microwave Plasma Reaction Nanopowders Process (the microwave process). The average number concentration for the operating processes was 25255±4705 and 22774±3672 #/cm^3 for the direct-current process and the microwave process, respectively. The average number concentration during shut-down periods was 14071±995 and 9918±1546#/cm^3 for the direct-current process and the microwave process, respectively. At the same time, the average number concentration was 11966±2332 and 22756±3642 #/cm^3 in the environment of the Environmental Nanotechnology Research Laboratory, ITRI and the ambient environment, respectively.
This research also evaluated the particle filtration efficiencies of respirator materials randomly selected from different types. The protection efficiencies for particle exposure by using N95, R95, P100, Gas filter and P100 were quite high. An operator inhaled about 8.0×10^7~1.6×10^8 particles per minute, even when wearing a gas filter, surgical mask or active carbon mask. However, the total concentration of inhalations decreased to 5.1×10^6~1.2×10^7 #/min, if the operator wore a N95, R95, P100 or Gas filter and P100. For these two processes, it is suggested that operators put on a disposal mask such as N95, R95 or higher grade to achieve better protection.

並列關鍵字

Plasma Manufacturing Process ； Nanoparticle ； Working Environment ； Exposure Evaluation

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