製作抗反射與低滑落角的次波長複層結構於矽基板上

Fabrication of subwavelength dual structures on silicon substrates with anti-reflection and low sliding angles

江杰修(Chiao-Hsiu Chiang)

指導教授 ： 王倫

國立臺灣大學/電機資訊學院/電機工程學研究所/碩士(2010年)

https://doi.org/10.6342/NTU.2010.02377

摘要

在各式各樣的光學應用中，例如在太陽能電池上的抗反射結構，自清潔功能也成了一個潛在需要的性質。而自清潔功能與小的滑落角息息相關。
從先前的文獻中我們發現同時擁有抗反射與較小滑落角的奈米結構已經被製作出來了，然而在文獻中此種擁有兩種特性的結構通常具有高深寬比。蟬翅上的奈米結構被發現可同時擁有此兩種特性，深寬比較低，並且某部份的這種結構屬於複層的結構。於是我們提出一個新的製程方法來製作這樣的結構。利用干涉微影及乾蝕刻的技術，我們製作出奈米複層結構，並且我們利用自行組裝的反射儀、接觸角量測儀跟滑落角量測儀來量測此種複層結構的反射率、接觸角及滑落角。

關鍵字

干涉微影 ； 抗反射 ； 疏水性 ； 乾蝕刻 ； 奈米複層結構

並列摘要

For various optical applications such as anti-reflection surfaces on solar cells, self-cleaning property is potentially required. The self-cleaning property is related to low sliding angle.
From previously published paper, some kinds of nano structures were fabricated to have anti-reflection and low sliding angle. However, these structures which possess both properties usually had high aspect ratios.
It was found that the nano structure on the surface of cicada wing possessed both properties simultaneously and has low aspect ratio. Some of the structures were found to be dual structures. We introduce a new method to fabricate this kind of dual structure. By using two-beam interference lithography and dry etching processes, the nano dual structures have been fabricated. The reflectance, contact angle, and sliding angle of the nano dual structures were measured by our home made reflectometer, contact angle analyzer, and sliding angle analyzer.

並列關鍵字

two-beam interference lithography ； anti-reflection ； hydrophobicity ； dry dtching ； nano dual structure

參考文獻

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