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  • 學位論文

液體霧化對流場表現之影響

Atomized liquid affect the performance of the flow field

指導教授 : 李宗翰

摘要


近年來大面積平面蝕刻加工越來越廣泛,隨著平面蝕刻加工面積的變大,產生許多蝕刻速率不均等的現象,本文著重在討論使用均流霧化噴頭進行汰換率增加的噴流,所造成之流場之變化,與其變化之克服。 本文之中先進行了該實驗器具的可重複性測試,在接下來進行出口與進口端的比較,在固定高度下改變壓力與流量時,其改變所影響之相對關係,最後就當流場之受到霧化噴流撞擊時所發生之現象與其深度進行測量,使其增加液體汰換率時也不會使得噴流直接撞擊工件表面,造成工件表面液壓不均狀態,以便解決大面積平面蝕刻時所發生的流場汰換率不均以及流場表面壓力不均之問題。

並列摘要


In recent years, large areas of flat etching process more and more widely, with the surface area of the larger etching process, resulting in many uneven etching rate of the phenomenon, this article focuses on using both the atomization nozzle flow rate of increase in jet replacement of the field caused by the change of his ilk, and their change of overcoming. This was the first among the experimental reproducibility of the test apparatus, for exports and imports in the next side of the comparison, at a fixed height to change the pressure and flow, its relative impact of changes in the relationship, and finally when the flow field of the subject spray jet crash that occurred when the depth of the phenomenon and its measurement, the liquid to increase the replacement of rate will not make a direct impact jet surface, resulting in uneven surface hydraulic state, in order to solve large-scale surface etching occurs when the replacement of rate of flow field and flow field uneven surface uneven pressure of the problem.

參考文獻


[10] 戴志光,「電化學原子力顯微鏡微影技術配合非等向性濕蝕刻之理論研究與實驗驗證」,2005。
[1] Bruce R. Munson, Donald F. Young and Theodore H. Okiishi, “Fundamentals of Fluid Mechanics 4th”.
參考文獻
[2] Shih Yi Wang, “Preliminary Mechanistic Study. The molecular aggregation-puddle formation hypothesis”, 1961, 1965.
[3] DisplaySearch台灣分公司2009年市場統計分析報告。

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