The purpose of adding dye in the formulation of the (Diazo naphthoquinone,DNQ)/ (Novolak) positive photo resist is increasing the absorption,and decreasing the reflection of incidence to reduce the standing wave. However, it’s not only adding more dye in the formulation to increase the optimum exposure energy, but also increasing of the cost. It’s studies in the changing of different of dye and PAC(Photo Active Compound)in the formulation of photo resist, and discusses the effect to the profile、resolution、exposure energy、DOF. Finally, it uses Design of experiment(DOE)to express the different kind of additives to the property of the photo resist, and the optimum formulation of the photo resist.
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