熱均壓製程對純鉻靶材微結構與機械性質影響之研究

Study of the Effects of Microstructure and Mechanical Properties on the Chromium Target by Hot Isostatic Pressing Treatment

呂崇瑋(Chung-Wei Lu)

指導教授 ： 張世賢

國立臺北科技大學/工程學院/材料科學與工程研究所/碩士(2010年)

https://doi.org/10.6841/NTUT.2010.00556

摘要

純鉻靶材近年來常用在金屬表面處理及平面顯示器的應用，因此其靶材的供應亦顯得更函重要；傳統製作純鉻靶材多冺用鑄造的方式，但其鑄錠常會有成份偏析、多孔性、及微結構不均勻等缺陷出現，即使經後續熱處理或熱函工亦無法將其完全去除。
本研究冺用真空燒結(Vacuum Sintering)、熱壓法(Hot Pressing)與封罐熱均壓(Canning-HIP)的粉末冶金方式製備純鉻靶材，藉由進行一系列的測試，以探討不同粉末冶金法對其特性之影響；此外，我們也冺用熱均壓(Hot Isostatic Pressing)製程來改善熱壓純鉻靶材之性質。
實驗結果顯示，燒結方法需較高的溫度(＞1480°C )以提供粉末燒結所需之驅動力；熱壓法製作的靶材經由熱均壓處理後可進一步提升其緻密性和性質，其中相對密度由98%提升至99.5%；而封罐熱均壓製程的純鉻靶材其相對密度更可高達99.7%，三點抗折強度(58 MPa)為真空燒結法製備之靶材的五倍以上，此外，利用封罐熱均壓所製備的鉻靶其電性(8.003 × 10-5 Ω-cm)和相對密度(99.7%)較佳，適合用於精密的濺鍍工業上。

關鍵字

鉻靶 ； 燒結 ； 熱壓 ； 封罐熱均壓 ； 粉末冶金 ； 熱均壓

並列摘要

In recent years, pure chromium of target was commonly used in metal surface treatment and flat-panel displays. Therefore, the target supplies were became more importantly. Traditionally, production of pure chromium target greater is using the casting methods, but the metal ingot frequently has an ingredient segregation, the porosity and non-uniform microstructure defects. Even if the subsequent heat treatment and the hot-working process will not be able completely eliminate.
In this research, we produce the Cr targets via vacuum sintering, hot Pressing and canning-HIP of powder metallurgy. Through a series of tests to explore the characteristics and effects of Cr targets by powder metallurgy. In addition, we also apply the Hot Isostatic Pressing (HIP) process to improve the properties of as-HP treated pure chromium targets.
The experimental result shows that the sintering requires a higher temperature (＞1480°C ) to provide the driving force of sintering procedure. The targets made by hot pressing may further improve the density and properties by HIP treatment. The relative density would increase from 98 to 99.5%. Canning-HIP of target can provide a higher density to 99.7%, and TRS (58 MPa) was more than five times to the vacuum sintering process. In addition, by using the canning-HIP process of chromium target that can get the optimal electrical (8.003 × 10-5 Ω-cm) and relative density (99.7%), which is better suited for the precision of sputtering industry.

並列關鍵字

Cr target ； sintering ； HP ； canning-HIP ； powder metallurgy ； HIP

參考文獻

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