影響電泳沉積法製備光子晶體的因子及其性質探討

Fabrication and Characterization of SiO2 Photonic Crystals Using Electrophorestic Deposition Method

陳元培(Yuan-Pei Chen)

指導教授 ： 廖朝光

元智大學/工程學院/化學工程與材料科學學系/碩士(2012年)

摘要

本研究係在利用控制不同電壓製程，在電泳沉積系統中自組裝成光子晶體薄膜，堆積出排列有序的光子晶體且有最佳的光能隙強度。首先利用溶膠凝膠法合成出均一粒徑分佈之二氧化矽粒子，藉由選擇溶劑、改變外加電壓、濃度、沉積時間之變因下，則以電泳的方法使粒子堆積於工作電極上，粒子能自行組裝成規則排列成光子晶體。實驗結果顯示，系統的影響因子會影響排列沉積狀態，當外加電壓的高、低與時間的長短會影響堆積厚度與粒子排列，而堆積的層數多寡也會影響晶體的光學性質。由上述操作因子實驗結果得知，發現電壓操作為主要的因子，對不同電壓操作模式做更進一步的探討：兩段式開關電壓、升梯式開關電壓、降梯式開關電壓，發現當降梯式電壓控制下堆積光子晶體，將導致光子晶體薄膜結構較緻密整齊，進而提升光能隙強度。

關鍵字

溶膠凝膠法 ； 電泳沉積法 ； 光子晶體 ； 二氧化矽

並列摘要

The quality of photonic band gap (PBG) film produced using uniform colloidal silica particles by electrophoresis deposition (EPD) method was studied. The colloidal silica particles were synthesized to form spherical shape at 430 nm uniformly. The SiO2 particles were dispersed in solvent and deposited electrophorestically on anode electrode under the applied voltage. The effects of the influential factors, such as applied voltage, concentration of the suspension, deposition time and pH values, on the EPD deposition process were analyzed. Results show that the morphology of the particle deposition can be affected by the influential factors. The applied voltage on the EPD deposition system was found to be the significant parameter to influence the PBG films. Different operations of the applied voltages, i.e. on-off voltage, voltage ascent, and voltage descent approaches, were carried out for the deposition process. From the data analysis, the quality of the PBG films can be significantly improved using the voltage descent operating condition.

並列關鍵字

sol-gel ； silica particles ； photonic band gap(PGB) films ； electrophoresis deposition method(EPD)

參考文獻

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