熱燈絲化學氣相沉積奈米鑽石薄膜於石英基板之研究

Growth of nanocrystalline diamond films on quartz by hot-filament chemical vapor deposition

余昆翰(Kun-Han Yu)

指導教授 ： 蔡宏營 ； 葉孟考

國立清華大學/工學院/動力機械工程學系/碩士(2011年)

https://doi.org/10.6843/NTHU.2011.00103

摘要

本研究以熱燈絲化學氣相沉積系統，以甲烷與氫氣混合氣體做為反應物，利用田口法L9(34)直交表規劃設計實驗，探討碳源濃度、腔體壓力、基板溫度及總氣體流率等因子對於沉積奈米鑽石薄膜於石英基板之影響。並以薄膜成長速率、表面粗糙度及可見光穿透率為品質特性，利用訊噪比(S/N ratio)與平均值找出品質特性之最佳參數組合，配合變異數分析(analysis of variance)與F檢定去除影響力較低之因子後，求出最佳值預測。過程中以掃描式電子顯微鏡及原子力顯微鏡檢測試片表面形貌與粗糙度、拉曼光譜儀檢測鑽石特性峰及光譜儀檢測可見光穿透率。本研究並以電泳沉積法及Polyethylenimine附著法等方式，討論此兩種非破壞性輔助鑽石成核方法對成核密度影響。最後在最佳化參數為12 %之碳源濃度、10 Torr之腔體壓力、600 ℃之基板溫度及總氣體流率為100 sccm的製程參數條件下，於可見光穿透率可達60 %左右，且在95 %信心水準下預測值與實驗值之信心區間有重疊的部分。

關鍵字

熱燈絲化學氣相沉積 ； 奈米鑽石 ； 田口法

並列摘要

In this research, a nanocrystalline diamond thin film was realized on a quartz substrate using hot filament chemical vapor deposition (HFCVD) and a mixture of methane and hydrogen as processing gas. Taguchi’s method with L9(34) orthogonal array was used to design the experimental parameters. Moreover, the effects of the CH4/H2 ratio, chamber pressure, substrate temperature, and total gas flow rate on the qualities of the nanocrystalline diamond film were discussed. Film growth rate, surface roughness and transmittance in the visible waveband were considered as quality characteristics. Using signal-to-noise ratio and the average value of the quality characteristics, optimal parameters can be found. Together with analysis of variance and F test, an optimal quality characteristic can be predicted, after eliminating factors with less influence. Scanning electron microscope and atomic force microscope were used to inspect the surface roughness and morphology of the diamond films. Raman spectrum was used to inspect the G-band and D-band, and a spectrometer was used to inspect the transmittance of the diamond film on the quartz substrate. Moreover, electrophoresis and Polyetherimide (PEI) adhesion methods as pretreatment on the quartz substrate were compared and discussed for their effects on nucleation density. Lastly, the optimal parameters obtained in this study was 12 % CH4/H2, camber pressure of 10 Torr, 600 ℃ substrate temperature, and total gas flow rate of 100 sccm. With these parameters, the transmittance in the visible waveband of a diamond film on quartz substrate can be increased up to 60 %. The overlapping confidential intervals of theoretical values and experimental results are over 95 %.

參考文獻

8.P. E. Davis, “Diamond Films And Coatings,” NOYES Publications, 1993.

1.K. E. Spear and J. P. Dismukes, “Synthetic diamond: emerging CVD science and technology,” Wiley, 1994.

2.P. K. Bachmann and R. Messier, “Advances in material sciences are paving the way for use of synthetic diamond,” Chemical & Engineering News, 1989.

4.J. C. Angus, “Growth of Diamond Seed Crystals by Vapor Deposition,” Journal of Applied Physics, Vol. 39, pp. 2915-2922, 1968.

5.S. Matsumoto, Y. Sato, M. Tsutsimi, and N. Setaka, “Growth of diamond particles from methane-hydrogen gas,” Journal of Materials Science, Vol. 17, pp. 3106-3112, 1982.