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  • 學位論文

以脈衝式電漿輔助化學氣相沉積法製備氟化非晶碳膜之研究

Preparation of Amorphous Fluorocarbon Films via Pulsed Plasma Enhanced chemical Vapor Deposition

指導教授 : 魏大欽
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摘要


中文摘要 氟化非晶碳膜(a-C:F films)廣泛應用於光學工業、生醫材料、疏水材料及半導體工業等。以電漿鍍膜方式來製備氟碳膜具有相當多的優勢,但其聚合之單體會在電漿中過度解離,而致使膜材難以保有原單體之特殊官能基,故本研究以C7FX單體(C7F8、C7F14及C7F16)作為成膜先驅物,並以脈衝式RF電漿源及改變試片位置,來探討電漿功率、能率循環、單體結構及進料配比對膜材性質之影響;此外,並將製備的膜材進行應用可行性之分析。其結果發現,較高膜材沉積速率可於較高平均供給能量參數下獲得;就沉積效能而言,脈衝式電漿可在低平均供給能量下有較高之沉積效率;此外,較低平均供給能量及離電漿區較遠之試片位置,皆可沉積出單體保有率較高之膜材,特別發現到試片在電極區所沉積之膜材,其表面與內部有不同之化學鍵結型態的呈現。FTIR分析結果呈現,C7F8單體聚合之膜材相較於其他單體具有C=C ring 及CF ring兩芳香環特徵吸收峰,而C7F16則是有較為明顯之a-PTFE吸收。另外可藉由解離出之CxFy自由基的不同黏滯係數,在適當沉積位置製備出高氟碳比及高CF2含量之膜材。最後,於氟碳膜應用之探討發現,保有C7F8單體芳香環之膜材,具有超疏水特性(接觸角163o),且由PL光電量測儀發現其膜材可發藍光之特性(波長450 nm);另外GEFC 117 膜經氟碳電漿改質過後,可有效減少甲醇對膜材的透過。

並列摘要


Abstract Plasma is one of the most popular techniques to obtain fluorocarbon films. However, most of plasma polymer films do not replicate the monomer structure. In this proposal, fluorocarbon film were deposited form C7F8, C7F14 and C7F16 monomers by pulsed-RF tubular plasma reactor. The effects of plasma parameters, on the bonding structure and characteristics of deposited films, were investigated. It was found that high average power resulted in a high deposition rate and low deposition efficiency. Moreover, low average power and remote plasma parameter would retain the monomer structure of the deposited films. The films placed in RF electrode have different characteristics in surface and bulk. The FTIR spectra showed absorption bonds corresponding to C=C ring and C-F ring of C7F8 plasma deposited films, and a-PTFE structure of C7F16 plasma deposited films. On the other hand, CxFy radicals of different sticking coefficient could be obtained in this system; suitable location could deposit high F/C ratio and CF2% PTFE-like film. Finally, super-hydrophobic property (CA:163o) and emitted blue light (wavelength 440 nm) of C7F8 plasma deposition films would be obtained; The plasma polymer layer on GEFC 117 membranes can reduce the permeability to methanol.

參考文獻


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