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  • 學位論文

幾何形狀於微影製程對位應用之研究

A Study on Geometric Figures for Photolithography Alignment

指導教授 : 林久翔
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摘要


在微機電製程的領域中,往往常用到半導體領域的相關製程如微影、蝕刻,本研究主要目的在探討幾何形狀於黃光微影對位之影響,主要是探討出各種幾何形狀對於人員疲勞度及對位精準度之影響進而找出使從業人員感到最舒適的對位圖形,及對位精準度最高之幾何形狀,得到最佳之對位件設計模式,以利從事黃光精密對位人員使用。 本研究採用不同層數之感光性乾膜,配合不同之對位形狀來製作實驗,在搭配視覺疲勞閃光融合閾值測量、對位時間量測、對位精準度量測再搭配主觀評量問卷的使用構成本次研究。 研究結果發現圖形對位越複雜(如十字與箭型)則所需的對位時間較長,對位精準度則較高,人員易產生疲勞現象,人員喜好度亦較低。然而在製程中對位精準度為首要之目標,故建議使用十字對位形狀作為製程使用。

並列摘要


Abstract In micro-electrical process, it offten uses some of the related process of the semiconductor area such as Lithography and Etching. The purpose of this research is to investigate the effect of the geometrical shape on the positioning task of the yellow light lithography. The study wishes to identify shapes that can minimize worker fatigue and maximize precision and comfort of the positioning task. The experimental factors include different layers of light sensing dry film and different positioning shapes. Dependent measures include Critical Flicker Fusion Frequency (CFF), positioning time, precision of positioning, and subjective assessment. The result found that the more complicated of the shapes (such as the cross and triangle), the longer time it takes for positioning tasks, the higher positioning precision, and the more tiring and less work satisfaction for the worker. In the production process, the positioning precision is the major concern. We suggest the use of the cross shape positioning mode for the production process. Keywords: Yellow Light Task Area, Lithography Positioning, Geometry Shape, Critical Flicker Fusion Frequency

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