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  • 學位論文

陽極層推進電漿源參數設計分析

A Study on the Design Parameters of Anode Layer Thruster Plasma

指導教授 : 鄧治東
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摘要


本文針對陽極層推進電漿源之陰陽極進行修改設計,以改善其電漿束之準直性,由於陽極層推進電漿源設計之關係,使其電漿束在射出時準直性不佳,在電漿製程中準直性不佳會導致電漿發散,必須加大製程電壓以彌補電漿強度不足,使得製程成本提高。以配向製程而言,撞擊配向膜材電漿束如果不夠準直,有可能使得液晶分子排列不夠整齊導致配向效果不如預期理想,進而影響液晶顯示之預傾角及對比度好壞,發散電漿亦有可能打到腔體產生微粒,污染到試片進而影響製程清潔度。 本文使用工業技術研究院所提供之原型電漿源作為對照組,另外設計兩組不同參數設計之電漿源,分別將電漿源陰極間距縮短及陽極間距拉長,並進行一系列之實驗,針對修改後之電漿源進行電漿強度診斷、感熱紙量測電漿束分佈及數值分析加以佐證實驗結果。 由實驗結果得知,將陰極間距縮短可有效提升電漿束之準直性,而將陽極間距拉長則無法提升其電漿束之準直性。本文最後亦將三組電漿源進行配向實驗,加以探討修改後之電漿源對配向有何影響。

並列摘要


In this study, the anode and the cathode of the anode layer thruster(ALT) plasma were modified to improve its beam isotropy. As a result ofthe design of the ALT, the plasma beam’s anisotropy would be affected.In plasma process, if the plasma beam is isotropic, it would lead toscattering of the plasma, consuming more power to compensate the lossof energy from the plasma. In alignment process, if the plasma beam isisotropic, it would impact on the arrangement of liquid crystal, affecting its pretilt angle and contrast ratio. In addition, scattered plasma has the potential of hitting the chamber of the plasma beam generator, emittingextremely small particles (~ 1 micron in size) and affecting the cleanness of the process.This study used the prototype plasma source developed by Industry Technology Research Institute (ITRI). For contrast purpose, two sets ofplasma beams were also designed to provide a variety of design parameters for the study. These design parameters included the shortening of the distance between the cathodes and the lengthening of the distance between the anodes. Subsequently, a series of experiments were done for the diagnostic of the plasma intensity, for the measurement of the distribution of the plasma beam using thermal sensing papers, and for the numerical analyses to check out the experimental results. Results of the experiments indicated that the anisotropy of the plasma beam was effectively enhanced by reducing the distance between the cathodes; however, the enhancement of anisotropy was minimal by lengthening the distance between the anodes. Furthermore, this study investigated the effectiveness related to the plasma beam alignment as a result of the changes of designs for the three sets of plasma beams under study.

參考文獻


29. 劉志宏,“應用實驗設計法與電漿診斷技術探討電漿沉積氟碳膜製程之研究”,博士
18. Dwight W.Berreman, “Solid Surface Shape and Alignment
4. J.Leon Shohet, “Plasma-Aided Manufacturing,” IEEE (1991).
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被引用紀錄


許翰林(2009)。以大氣電漿進行薄膜表面處理之研究〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu200901175

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