添加氮氣及氮氣電漿後處理對類鑽碳膜之影響

Effects of nitrogen content and nitrogen plasma post-treatment on diamond-like carbon films

方彥理(Yan-Li Fang)

指導教授 ： 曾信雄

大同大學/工程學院/材料工程學系所/碩士(2009年)

摘要

中文摘要
本實驗以乙炔做為反應氣體，使用射頻電漿輔助化學氣相沉積法在矽基材上沉積類鑽碳膜，探討不同乙炔/氮氣比之沉積、不同電漿後處理氣氛與時間，及不同氮氣電漿後處理壓力對碳膜形態與性質所造成之影響。量測部分以原子力顯微鏡觀察各條件下碳膜之表面形貌及粗糙度，拉曼光譜儀分析碳膜結構，表面輪廓儀量測膜厚，奈米壓痕儀量測碳膜之硬度及楊氏模數及麥克森干涉儀量測碳膜之殘留應力。
實驗結果發現隨著氮氣/乙炔流量比的提升，所沉積出的碳膜表面粗糙度略為下降，碳膜中的sp2比例上升，並且沉積速率急遽下降。而在相同電漿後處理條件下的結果發現，隨氫氣電漿後處理時間增加碳膜粗糙度下降，然而氮氣電漿後處理時間的增加卻會使表面粗糙度明顯提升；膜厚分析結果發現，膜厚皆隨著氫氣及氮氣電漿後處理時間的增加而下降。在不同壓力下對碳膜進行氮氣電漿後處理的實驗中發現，於0.9torr的較高壓力下對碳膜後處理，會造成表面粗糙度較原始試片粗糙度上升許多，硬度呈現些微下降；然而在較低壓力的0.15torr時，能有效降低粗糙度，然而其硬度降低的幅度較大。

關鍵字

電漿後處理 ； 類鑚碳膜 ； 氮氣電漿

並列摘要

英文摘要
Diamond-like carbon (DLC) films were deposited on silicon substrate using acetylene as carbon source by RF plasma enhanced chemical vapor deposition (RF-PECVD). The deposition at different acetylene/nitrogen ratios, different plasma post-treatment atmosphere and times, and nitrogen plasma post-treatment at different pressures were investigated. The surface roughness, microstructure and film thickness of DLC films were characterized by Atomic Force Microscopic (AFM), Raman Spectroscopy and Alpha-Step profilometer. The surface hardness,Young’s Modulus and residual stress were analyzed by nano-indenter and Michelson interferometer, respectively. The experimental results shows that the surface roughness of DLC film decreased slightly with increasing acetylene/nitrogen ratio. The Raman results indicate that sp2 proportion in DLC films increased when the acetylene/nitrogen ratio decreased. Also, the deposition rate showed a rapid reduction. For the hydrogen plasma post-treatment, the surface roughness decreased when raising the treatment time. On the other hand, it increased dramatically after nitrogen plasma post-treatment was performed. For the measurement of film thickness, it was found that the film thickness decreased after both nitrogen and hydrogen plasma post-treatments were performed. Nitrogen post-treatment at different pressures show that , post treatment at a higher pressure 0.9torr resulted in a rougher surface, and the hardness reduce a little. On the other hand, post-treatment at a lower pressure 0.15 torr, led to a smoother surface with a larger decrease in hardness.

並列關鍵字

plasma post-treatment ； Diamond-like carbon films ； nitrogen plasma

參考文獻

[8] B. R. Huang, C. S. Yeh, S. F. Lee, D. C. Wang, K. G. Chen, N.C.Mat. 23 (2008) 209-251.

[1] A. G. Whittaker, Science. 200 (1978) 763-764.

[9] Y. Umehara, S. Murai, Y. Koide, M. Murakami, Diamond Relat. Mater. 11 (2002) 1429-1435.

[11] D. Temple, Mater. Sci. & Eng. R24 (1999) 185-239.

[13] W. D. Kingery, H. K. Bowen, D. R. Uhlmann. Introduction to Ceramics (1991).