聚苯乙烯球微影技術製作寬頻譜抗反射次微米仿生結構

Fabrication of Broadbaand Antireflective Sub-micron Biomimetic Structures by Polystyrene Spheres Lithography

李有璋(Yeeu-Chang Lee) ； 周彥宇(Yen-Yu Chou) ； 張哲郡(Che-Chun Chang)

《先進工程學刊》 7卷4期 (2012/10) Pp. 145-149

https://doi.org/10.29948/JAE.201210.0001

摘要

次波長仿生結構具有優異的抗反射特性，因此逐漸取代傳統的抗反射膜，並應用於太陽能電池以增加光電轉換效率。本研究利用奈米球微影配合兩段式ICP與HDP蝕刻技術，成功的在矽基板表面製作不同表面形貌以及高度超過700nm的次微米結構陣列，其中圓錐結構的抗反射效果最佳，在300～1200nm波長範圍中，可有效將反射率抑制在1％以下。

關鍵字

次微米仿生結構 ； 抗反射 ； 聚苯乙烯球微影

並列摘要

Conventional anti-reflection (AR) thin films have been gradually replaced by Biomimetic sub-wavelength structures due to their good AR property of broadband wavelength, and are widely used in solar cell surface in order to increase the efficiency of photoelectric conversion. In this paper, various surface morphology biomimetic structures are successfully fabricated on Si substrate by polystyrene spheres lithography with two-step inductive coupling plasma (ICP) and high density plasma (HDP) etching processes. And various sub-micron array structures with 700 nm heights or above are successfully fabricated. Among them, the results show that sub-micron cone structure has the best anti-reflection performance, and the average reflectance are effectively suppressed below 1% within a spectral range from 300 to 1200 nm as well.

並列關鍵字

biomimetic sub-micron structures ； anti-reflection ； polystyrene spheres lithography