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  • 學位論文

以專利指標探討電漿顯示器技術發展趨勢之研究

Probe into the research of the electric technological development trend of plasma display with the patent index

指導教授 : 耿筠
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摘要


台灣科技產業發展到現在正面臨外在與內在的壓力,台灣急需倚賴優勢產業及新興產業的發展以維持未來經濟的成長。台灣的高科技產業發展至此,從早期簡單的電子零件裝配廠開始發展至成為全球的半導體量產重鎮,然後再隨著全球產業發展的脈動進入目前的平面顯示器產業,PDP為重要的產品發展方向。這些產業一路發展過來,台灣已累積了多年的高科技量產經驗與基礎。企業若要保持競爭優勢可透過產業中領先者及競爭者的技術發展趨勢加以系統化的評估與分析,進行適切的技術與產品的研發,而掌握技術發展趨勢最快速也最有效的途徑便是藉由專利資訊。 本研究使用專利分析與技術生命週期之觀點,對PDP技術發展進行趨勢的預測,本研究獲得之主要結論有二:第一、我國企業可將重心放在驅動電路、電源設計、影像處理技術……等週邊技術進行專利的研發與佈局,以確保企業在該領域的領先地位;第二、PDP技術的成長期將會藉由2008年北京奧運會將會將PDP帶進另一個高峰。

並列摘要


The development of scientific and technological industries in Taiwan is facing both of external and inherent pressures now, therefore, Taiwan needs to rely on the competitiveness and advantages of newly developed industries in order to maintain economic growth in future. The history of Hi-Tech industry began with assembling-factory of simple electronic parts to global semiconductor giant. Now, it follows the global hi-tech industries development to enter the technology of plate panel displays. PDP is now the very important field for product development. Taiwan has accumulated many years of hi-tech production experience. To remain its competitiveness, an enterprise can carry out systematic evaluation and analysis on the technical development of the competitor or the industry leader, then proceeds with appropriate technical and product development. The most efficient way of getting new technology development is through patent information. Our research uses the viewpoint of patent analysis and technology life cycle to predict the trend of PDP technology development. Our conclusions are the following: 1.Local enterprise can focus on driver circuit、Power supply design、Image processing Skill…etc, to develop new patent of new technology in order to remain the leading role in its field. 2.Growth of PDP technology will enter its high peak phase when Olympic Game hold in Bei-jin in year 2008.

參考文獻


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被引用紀錄


劉鳳玲(2012)。以專利分析探討RFID電子封條之產業技術與趨勢〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201200964

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