雙光子聚合微製造技術以能量均勻橢圓體為基之曝光時間最佳化研究

The Optimization of Exposure Time based on Uniform Energy Ellipsoid for Two-photon Polymerization Micro-manufacturing

董家威(Chia-Wei Tung)

指導教授 ： 廖昭仰

國立中央大學/工學院/機械工程學系/碩士(2014年)

摘要

雙光子聚合(Two-photon Polymerization, TPP)微製造技術由於可製作任意微/奈米尺寸級之複雜立體外型結構，運用領域廣泛，因而成為熱門之研究。在目前相關研究中，提高TPP製程效率與良率、與目標物品精度，一直是各方專家相繼努力之方向。本論文利用高斯光束推導出不同能量之能量均勻橢圓體、統計學上目標函式，計算出最適合雷射曝光位置，使得欲加工之微結構體素重疊能量均一以達到雷射曝光最佳化，提高微結構之尺寸精度，並且降低聚合時發生微爆炸之機率。最後本文提出幾個微結構範例顯示此方法改良之最佳化。

關鍵字

雙光子聚合技術 ； 雙光子吸收 ； 微製造 ； 最佳化 ； 高斯光束 ； 雷射曝光

並列摘要

Due to Two-Photon Polymerization(TPP) micro-fabrication technology, it can be made in any three-dimensional complex shape and structure of micro/nano scale ,which is used in a wide range of fields , TPP micro-fabrication has become a popular issue.
In the present studies , improving fabrication efficiency , micro-structure quality and enhancing object profile accuracy , all of these mentioned above has been already strive to do in every area of expert . This paper use Gauss Beam derivate many different uniform energy ellipsoid and built object function of statistics to calculate suitable laser exposure position . Not only micro structure voxel overlap ratio can become more uniform, which makes profile more accurate, but lower down the probability of micro-explosion when the structure in polymerization . At last , this paper will demonstrate some micro structure example before optimizing and after optimizing to prove this optimization feasibility.

並列關鍵字

Two-Photon Polymerization ； Two-Photon absorb ； mMcro-fabrication ； Optimization ； Gauss Beam ； Laser Exposure

參考文獻

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