為瞭解半導體廠園區大氣氣膠粒徑分佈特性,本研究於2009年11月至2010年7月間於南部某半導體廠為主之科學園區服務中心樓頂(12 m高)、西南側污水廠樓頂(16 m高)及半導體廠中心樓頂(48.9 m高),以微孔均勻沉積衝擊器(MOUDI)採集大氣0.056~18 µm微粒,以分道採樣器(Dichot)採集大氣粗(PM2.5-10)、細(PM2.5)微粒,分析微粒上Na+、K+、Ca2+、Mg2+、NH4+、F-、Cl-、NO3-及SO42-等9種水溶性離子、碳成分及金屬成分,以探討半導體廠園區大氣氣膠組成及粒徑分佈特性。初步研究結果顯示:半導體廠園區樓頂大氣PM10上細微粒(PM2.5)所佔比值(即PM2.5/PM10)之範圍為0.55~0.72,平均值為0.60±0.06。半導體廠園區大氣粗(PM2.5-10)、細(PM2.5)微粒上所分析之水溶性離子均以NH4+、NO3-及SO42-等衍生性氣膠為主,所分析之9種水溶性離子中此三種衍生性氣膠濃度和佔之比例在PM2.5上達85%以上,而在PM2.5-10上則約60%;粗、細微粒上TC所佔之百分比分別為31±1%及34±1%,且粗、細微粒上OC/EC比值在2以上;半導體廠園區大氣PM2.5上水溶性離子、碳成分及金屬元素佔之比例依序分別為50、34及9%,而在PM2.5-10其值則依序分別為26、33及12%。半導體廠園區大氣微粒均呈雙峰分佈,其主峰均位於粗微粒(3.2~5.6 μm)上,而次峰則均位於細微粒(1.0~1.8 μm)上。
This study investigates the characteristics of particle size distribution of ambient aerosols in a semi-conductor industrial park in southern Taiwan. The sampling was performed at three sites in the park: roof of the service center (12 m high), roof of a waste water treatment plant (16 m high, southwest of the park), and roof of a semi-conductor plant (48.9 m high). Particle samples were collected from November, 2009 to July, 2010 using MOUDI for 0.056–18 µm particles and Dichot for PM2.5-10 and PM2.5. Particle compositions (water-soluble ions (Na+, K+, Ca2+, Mg2+, NH4+, F-, Cl-, NO3-, and SO42-), carbon content, and metallic species) and size distributions of were examined. The results showed that the PM2.5/PM10 ratios were 0.55–0.72 (0.60±0.06 in average) at the roofs of the semi-conductor industrial park. The major water-soluble ions in PM2.5-10 and PM2.5 were secondary aerosols, such as NH4+, NO3-, and SO42-, accounting for 85% and 60% of water-soluble ions in PM2.5 and PM2.5-10, respectively. The average percentages of TC were 31±1% and 34±1% in PM2.5-10 and PM2.5, respectively. The ratios of OC/EC were more than 2 for both coarse and fine particles. In PM2.5, the water-soluble ions, carbon species, and metallic elements were 50%, 34%, and 9%, respectively, in the semi-conductor industrial park and these values were 26%, 33%, and 12%, respectively, in PM2.5-10. In the semi-conductor industrial park, the particle size distribution of ambient particles was bi-modal, with a primary peak in coarse size (3.2–5.6 μm) and a secondary peak in fine size (1.0–1.8 μm).
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