氮氧化鈦薄膜XPS表面分析

X-ray Photoelectron Spectroscopy Study of Titanium Oxynitride Films

林政緯(Chung-Wei Lin)

指導教授 ： 林鴻明

大同大學/工程學院/材料工程學系所/碩士(2011年)

摘要

隨著科技發展越趨迅速，環境的汙染也變得更加嚴重，對於環境保護的研究受到重大的關注，所以節約能源、綠色環保和再生能源之發展就更加受到重視。目前二氧化鈦(TiO2)因具有化學性質穩定、氧化能力強且不具毒性，所以在光觸媒中最常做為研究的材料。但若是在不同的氣氛下所產成的鍵結強度也會有所不同，所以本實驗藉以通入不同氣體並在X光光電子能譜儀(X-ray Photoelectron Spectroscopy,XPS)中進行清理及蝕刻進行表面分析。

本實驗使用離子束濺鍍系統(ion beam sputter deposition)，並於鍍製過程中加熱至400℃，使二氧化鈦形成銳鈦礦結晶。探討分別通入(1)氧氣(O2)與氮氣(N2)、(2)氧氣(O2)與笑氣(N2O)和(3)氧氣(O2)與氨氣(NH3)作為反應氣體，以及分別使用(4)氬氣(Ar)及(5)氮氣(N2)為工作氣體鍍製之氮氧化鈦薄膜在X光光電子能譜儀(X-ray Photoelectron Spectroscopy,XPS)中進行清理及蝕刻，得到的Ti2p、O1s、N1s圖譜。並由這些圖譜中探討其鍵結的差異性。

關鍵字

能隙 ； 氮氣 ； 笑氣 ； 氨氣 ； 離子束濺鍍 ； 氮氧化鈦

並列摘要

With the increasingly rapid technological development, environmental pollution has become more serious for the environment protection of research by a major concern, so energy conservation, environmental protection and renewable energy development of even more attention. Currently titanium dioxide (TiO2) due to a chemical stability, oxidation ability of no toxic, so the most commonly used as research in the photocatalyst material. However, if in a different atmosphere as produced by the binding strength will be different, so different in this experiment in order to pass into the gas and the X-ray photoelectron spectroscopy (X-ray Photoelectron Spectroscopy, XPS) to clean and etch in surface analysis.

As a photocatalyst, titanium oxynitride is a great potential material. How the deposition environment and methods affected the films are the interesting research. In this study, The Titanium oxynitride films (TiOxNy) were deposited by ion beam sputtering system. at the quartz substrate temperature was 400. The argon ion beam was used to sputter the titanium under three gas mixtures: NH3/O2, N2/O2, and NH3/O2and analyzed the bonding by X-ray photoelectron spectroscopy. Finally, the films were respectively clear and etched by Ar ion-source before measured by XPS and than results in various bonding were observed in Ti2p3/2, O1s, and N1s spectra.

並列關鍵字

NH3 ； Ion Beam Sputter Deposition. ； TiOxNy ； N2O ； Energy Gap ； N2

參考文獻

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