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7005/Al2O(下標 3(P))鋁基複合材料鍍銅行爲研究

Plating of Copper on An 7005/Al2O(subscript 3(P)) Metal Matrix Composite

摘要


Copper plating on 7005/Al2O(subscript 3(P)) metal matrix composite (MMC) is facilitated by a previously anodizing of the MMC. Anodizing conducted in phosphoric acid (P) is better than in oxalic (O) and sulfuric (S) acids. Cyclic anodic potentiodynamic polarization curve (CAPPC) in P shows a positive hyteresis with higher current density and greater gap between the forward and reverse scans. Scanning electron micrograph (SEM) depicts that the surface anodized in P is cleaner and smoother than anodized in O and S. Electrochemical impedance spectroscopy (EIS) demonstrates that the film produced in P has smaller resistance and capacitance. Cyclic cathodic potentiodynamic polarization curve (CAPPC) for the anodized MMC was applied to estimate the decomposition potential (DP) and crossover potential (COP) in copper sulfate. The value of DP is P>O>S but NOP reverses the order. The higher the DP, the more readily of copper plating; the less the NOP the easier nucleation of the deposits. Thus, the MMC previously anodized in P tends to obtain a refined and dense copper coat.

並列摘要


Copper plating on 7005/Al2O(subscript 3(P)) metal matrix composite (MMC) is facilitated by a previously anodizing of the MMC. Anodizing conducted in phosphoric acid (P) is better than in oxalic (O) and sulfuric (S) acids. Cyclic anodic potentiodynamic polarization curve (CAPPC) in P shows a positive hyteresis with higher current density and greater gap between the forward and reverse scans. Scanning electron micrograph (SEM) depicts that the surface anodized in P is cleaner and smoother than anodized in O and S. Electrochemical impedance spectroscopy (EIS) demonstrates that the film produced in P has smaller resistance and capacitance. Cyclic cathodic potentiodynamic polarization curve (CAPPC) for the anodized MMC was applied to estimate the decomposition potential (DP) and crossover potential (COP) in copper sulfate. The value of DP is P>O>S but NOP reverses the order. The higher the DP, the more readily of copper plating; the less the NOP the easier nucleation of the deposits. Thus, the MMC previously anodized in P tends to obtain a refined and dense copper coat.

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