- 期刊
- OpenAccess
Study of Metal and Semiconductor Surfaces Using Field Ion Microscopy
並列摘要
A versatile metal Field Ion Microscope was designed and constructed. It features an axial feedthrough planetary drive for contacting the tip. The surface of the tip can be coated with other elements in situ for the interface study. We have developed very effective method of preparing specimen tips. The image on 3” diameter screen is intensified by a microchannel plate, The optimum operating field strengths were ranged from 2 x 10^8 volts to 4.5 x 10^8 volts/cm, while the magnification can be varied up to 5 x 10^6 with the resolution of better than 2.75Å. The surface atoms of successive layer were cleaved by the pulse field evaporation. FIM images of tungsten, molybdenum, gold coated metals and tungsten silicides were observed and analysed. This is the first FIM in Korea.
並列關鍵字
無資料被引用紀錄
延伸閱讀
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