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Diffraction Limit for a Circular Mask with a Periodic Pinhole Array
並列摘要
Most investigations of masks with periodic apertures in the literature are limited only to far-field diffraction, and they did not take the degraded quality of the shaped image due to the translation effect among small apertures (pinholes) into account, or the mathematical derivation which was used to analyze these problems is too complicated. The results of such studies were not sufficiently concrete, and they also failed to satisfy the rules for a photo mask design. This paper offers a quick and precise method to analyze the ”blurring” generated by the translation effect of a small aperture (pinhole). It points out that the applicable conditions for image shaping of a circular pinhole in a circular mask should be redefined by a theoretical understanding of the near-field effect; additionally it provides certain embodied and useful reference rules for the design of a mask with a pinhole array.
並列關鍵字
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延伸閱讀
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