Title

雙向對接曝光法複製光柵尺的研究

Translated Titles

The Study of the Replication for Length Grating by the Bidirectional Butt Joint Exposure Method

Authors

趙澤宇(Ze-Yu Zhao)

Key Words

光柵尺 ; 曝光 ; 複製 ; 雙向對接曝光 ; length grating ; exposure ; replication ; bidirectional butt joint exposure method

PublicationName

光電子·激光

Volume or Term/Year and Month of Publication

16卷8期(2005 / 08 / 15)

Page #

926 - 929

Content Language

簡體中文

Chinese Abstract

提出了光柵尺複製工藝中一種新的曝光方法―雙向對接曝光法。根據光刻膠的曝光量與曝光時間成正比的關係,推導出光柵尺對接重合處任意一點的曝光量與其他各處的曝光量相同,由此提出採用雙向對接曝光技術來解決曝光設備的導軌有效行程過短的問題。實驗中,利用導軌有效行程為1.6 m的曝光設備複製出測長為2.0 m的光柵尺,其最大線性誤差為±17.0 μm,完全滿足使用要求。實驗表明,採用雙向對接曝光技術,曝光重合處的光柵線條完全滿足測量要求,大幅度提高了曝光的有效行程,解決了曝光機導軌行程短的問題。

English Abstract

A new exposure method for replicating length grating, the bidirectional butt joint exposure method, is presented. Based on the principle that the exposure dose between superposition area and the others are equivalent, the bidirectional butt joint exposure method is brought forward to solve the problem that the device's exposure track is too short. In experiment, we used the 1.6m length of exposure available track to replicate 2.0 m length grating, and its maximal linearity error is ±17.0 μm. Based on experiments, using this method, the grating's lines of the exposure superposition area satisfies the requirements of measurement precision, the length of exposure availability track will be sharply increased, and the problem that the device's exposure track is too short is resolved perfectly.

Topic Category 基礎與應用科學 > 物理
工程學 > 電機工程