利用紫外光與臭氧系統去除光罩污染物

Cleaning Mask Mura by UV-Ozone System

陳柏村(Boeth Chen)

指導教授 ： 鄭國忠

國立臺北科技大學/工程學院/化學工程所/碩士(2006年)

摘要

以紫外光與臭氧的系統分解光阻劑已被探討。模型化合物為紅色、綠色或藍色光阻劑被塗佈在玻璃上；之後形成膜在波長185與254奈米之紫外光下曝光。以SEM(掃描式電子顯微鏡), ATR-FTIR(全反射式傅立葉轉換紅外光譜儀)與MCPD(多頻分光偵測器)測量與觀察膜之厚度與形態的改變。其被發現光阻可以經由短時間在紫外光與臭氧下分解而被清潔。根據此結果，紫外光-臭氧系統被裝配設置用以清潔光罩上的污染物。其可在小於10分鐘內有效的清潔光罩在乾燥製程下。

關鍵字

TFT-LCD ； 彩色濾光片 ； 臭氧 ； 紫外光 ； 光罩霧化

並列摘要

The decomposition of the color photoresistant by the ultraviolet light and ozone system were investigated. The model compound, R, G, or B color photoresistant, was coated on a glass; then the formed film was exposured under an ultraviolet light, wavelength are 185 and 254 nm. The changes of the film thickness and morphology were determined and observed by a SEM, ATR-FTIR, and multichannel photodetector. It was found that the color photoresistant can be cleaned via decomposition under UV light and ozone in a short time. Based on the result, a UV-Ozone system was setup to clean the pollutant on the photo-mask. It is effective to clean photo-mask in less than 10 minutes under the dry process.

並列關鍵字

TFT-LCD ； Color filter ； Ozone ； UV light ； photo mask mist

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