Title

以電漿輔助化學氣相沈積法於矽懸臂沈積之氮化矽薄膜應力對機械損耗之影響暨機械損耗量測系統改善

Translated Titles

Stress effect on mechanical loss of the SiNx film deposited with PECVD method on silicon cantilever and setup for the loss measurement improvement

Authors

莊友杭

Key Words

機械損耗 ; 矽懸臂 ; 氮化矽 ; 電漿輔助化學氣相沈積法 ; 重力波 ; mechanical loss ; cantilever ; silicon nitride ; PECVD ; gravitational wave

PublicationName

清華大學光電工程研究所學位論文

Volume or Term/Year and Month of Publication

2014年

Academic Degree Category

碩士

Advisor

趙煦

Content Language

繁體中文

Chinese Abstract

美國雷射干涉重力波組織 (Laser Interferometer Gravitational Wave Observatory ;LIGO)以偵測重力波為主要研究項目,短期目標是以實際偵測到的重力波證明愛因斯坦的廣義相對論,長期目標則是希望能將重力波運用於各種天文現象的觀察及建立重力波天文網,例如中子星(neutron star)、黑(black hole)、超新星(supernovae)…等大質量星體的訊號。由於重力波的訊號相當微弱,因此需盡可能地排除外在雜訊的干擾,而在其總體雜訊最低的100Hz處,雜訊主要來自於光學反射鏡自身材料所產生的熱擾動,因此本實驗室的研究目標即是找尋光學損耗、機械損耗皆低的光學薄膜材料。 本論文的研究重點係以電漿輔助化學氣相沉積系統於矽懸臂上鍍製各種不同成分的氮化矽薄膜,並檢視各成分薄膜的光學特性(折射率、消散係數)、機械特性(薄膜應力、楊氏係數)及機械損耗特性,其中薄膜應力與機械損號間的關係為本論文將深入探討之重點。此外,本論文的另一重點為本實驗室室溫機械損耗量測系統的抽氣速率改善,以及低溫機械損耗量測系統之架設。

Topic Category 電機資訊學院 > 光電工程研究所
工程學 > 電機工程
Reference
  1. [1] A.Eistein, “Die Grundlage der allgemeinen Relativitatstheorie ”,Annalen der   
    連結:
  2. Physik 49.769(1916)
    連結:
  3. [2] R.A.Hulse et al.,“Discovery of a pulsar in a binary system”,The Astrophysical journal 195.L51(1975)
    連結:
  4. [3] J.Weber,“Detection and generation of gravitational waves”,Physical Review 11.7306-313(1960)
    連結:
  5. [4] A. M. Sintes,“Towards gravitational wave astronomy”,LIGO document: G1300750-v1
    連結:
  6. [6] R.F.Greene et al.,“On the formalism of thermodynamic fluctuation theory”,Physical Review 83.1231(1951)
    連結:
  7. [7] H.B.Callen et al.,“On a theorem of irreversible thermodynamic”,Physical Review 86. 702(1952)
    連結:
  8. [8] Krzysztof Hejduk et al.,“Dielectric coatings for infrared detectors”,Optical Applicata Vol.XXXV,No.3(2005)
    連結:
  9. [9] Scott S. Verbridge at al.,“High quality factor resonance at room temperature with nanostrings under high tensile stress”,Applied physics 99.124304(2006)
    連結:
  10. [10] Scott S. Verbridge at al., “Macroscopic Tuning of Nanomechanics: Substrate Bending for Reversible Control of Frequency and Quality Factor of Nanostring Resonators”,Nano Letters Vol.7,No.6.1728(2007)
    連結:
  11. [11] D.R.Southworth at al.,“Stress and Silicon Nitride: A Crack in the Universal Dissipation Glasses”,Physical Review 102.225503(2009)
    連結:
  12. [12] Jiansheng Wu and Clare C.Yu ,“How stress can reduce dissipation in glasses”,Physical Review B 84.174109(2011)
    連結:
  13. [14] I.W.Martin,“Studies of materials for use in future interferometric gravitational wave detectors”,Ph.D thesis,University of Glasgow(2009)
    連結:
  14. [15] 王薇雅“應用於雷射干涉重力波偵測器開發工作之單晶矽懸臂樑之機械震動性質研究”,國立清華大學,碩士論文(2013)
    連結:
  15. [18] Donald L. Smith at al.,“Mechanism of SiNxHy Deposition from NH -SiH4 Plasma”, J. Electrochem. Soc., Vol. 137, No. 2(1990)
    連結:
  16. [19] J.N. Chiang et al.,“Mechanistic Considerations in the Plasma Deposition of silicon nitride film” J. Electrochem. Soc., Vol. 137, No. 7(1990)
    連結:
  17. [20] David Necas et al.,“Optical characterization of non-stoichiometric silicon nitride
    連結:
  18. [21] H.Huang et al.,“Characteristic of low temperature PECVD silicon nitride for MEMS structural materials”J.Modern Physics B,Vol. 20, 3799-3804 (2006)
    連結:
  19. [24] J. H. Scofield,“Hartree-slater subshell photoionization cross-sections at 1254 and
    連結:
  20. 1487 eV”, Journal of Electron Spectroscopy and Related Phenomena, 8.129- l 37(1976)
    連結:
  21. [25] 陳宏彬“橢圓偏光儀之原理與應用” 儀科中心簡訊80期(2007)
    連結:
  22. [27] G. E. Jellison et al.,“Parameterization of the optical functions of amorphous materials in the interband region”, Applied Physics Letters, Vol. 69, Issue 3,371(1996)
    連結:
  23. [28] G.E. Jellison et al.,“Spectroscopic ellipsometry characterization of thin-film silicon nitride”,Thin Solid Films,Vol. 313-314,193-197(1998)
    連結:
  24. [29] Abbe, E. “Beiträge zur Theorie des Mikroskops undder mikroskopischen Wahrnehmung”. Arch. Mikr. Anat. 9:413–420. (1873)
    連結:
  25. [30] “半導體材料分析技術與見習“,國家奈米元件實驗室(2012)
    連結:
  26. [32] G.Gerald Stoney, “The Tension of Metallic Films Deposited by Electrolysis”, Proceedings The Royal of Society A,82.172-175(1909)
    連結:
  27. [33] “FLX-2320 Thin Film Stress Measurement User Manual”,Tencor(1995)
    連結:
  28. [34] Oliver W.C. et al., “Improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments”, Journal of Materials Research,7.1564-1580(1992)
    連結:
  29. [36] S.T.Thornton et al.,“Classical dynamics of particles and systems”,Brooks Cole, fifth edition, pp.109-121(2003)
    連結:
  30. [37] B.S.Berry et al.,“Vibrating reed internal friction apparatus for films and foils”, IBM journal of research and development,19.334(1975)
    連結:
  31. [39] 歐政勳,“室溫下量測機械損耗之系統設置與量測熔融石英玻璃懸臂及單晶矽懸臂之初步量測分析”,國立清華大學,碩士論文(2012)
    連結:
  32. [41] Matthew A.Hopcroft et al.,“What is the Young´modulus of silicon?”,Journal of Microelectromechanical system19.229(2010)
    連結:
  33. [44] Johannes Eichholz,UF LIGO Group, “Investigation of Coating Thermal Noise at
    連結:
  34. [46]王順錦, “應用於雷射干涉重力波偵測器之以離子束濺鍍法製作之奈米膜層結構高反射鏡及其結晶條件之探討”,國立清華大學,碩士論文(2013)
    連結:
  35. [47] R Flaminio,et al “A study of coating mechanical and optical losses in view of reducing mirror thermal noise in graviational wave detectors.” Class. Quantum Grav. 27.084030 (2010)
    連結:
  36. [5] H.B.Callen et al.,“Irreversibility and generalized noise”,Physical Review 83.34(1951)
  37. [13] K.D.Mackenize at al.,“Stress Control of Si-based PECVD Dielectrics”, Unaxis USA,Inc.,10050 16th Street North,St.Peterburg,FL33716
  38. [16] 李家暐,“探討應用於雷射干涉重力波偵測器之以電漿輔助化學氣相沉積
  39. 法製備於矽懸臂之氮化矽薄膜之材料特性與機械損耗”國立清華大學,碩士論文(2013)
  40. [17] H.Xiao,“半導體製程技術導論”歐亞書局(2011)
  41. films”phys.state.(c),No.5(2008)
  42. [22] 陳俊龍,“AES/ESCA 表面分析技術於工業材料上的應用”,工業材料106期(1995)
  43. [23] John F.Watts,John Wolstenholme,“An Introduction to Surface Analysis by XPS and AES”Wiley(2003)
  44. [26] “CompleteEASETM Data Analysis Manual”, J. A. Woollam Co.,Inc(2009)
  45. [31] 李正中, “薄膜光學與鍍膜技術”,第七版,藝軒圖書出版社(2012)
  46. [35] “Operational manual of Nano Indenter XP System”,MTS company,USA
  47. [38] R.M.Jones ,“Mechanics of composite materials”,ch3.2,Philadelphia : Taylor & Francis(1999)
  48. [40] A.S.Nowick et al.,“Anelastic relaxation in crystalline solid”,New York:Academic Press(1972)
  49. [42] S.Reid et al.,“Mechanical dissipation in silicon flexures”,Physics Letter A351
  50. .205(2006)
  51. [43] 呂登復,“實用真空技術”,國興出版社(2007)
  52. Cryogenic Temperatures for Third-Generation Interferometric Gravitational-Wave Detectors”,LIGO document: LIGO-G1400024 (2014)
  53. [45] “Operating Instructions for The Janis Research Model SHI-4XG-15 Refrigeration System”,Janis Research Company,LLC
Times Cited
  1. 謝鎮州(2015)。利用電漿輔助化學氣相沉積法沉積之非晶矽與二氧化矽薄膜其光學與機械性質之研究。清華大學光電工程研究所學位論文。2015。1-61。