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  • 學位論文

回收正型光阻劑於TFT陣列製程之應用及評估

The Application and Evaluation of Recycled Positive Photoresist in TFT Array Process

指導教授 : 溫武義
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摘要


中文摘要 本研究之主要目的乃在於評估將TFT-LCD黃光(Photo)製程中使用過的廢光阻劑回收重製後,再度利用於相同製程的可行性,並尋求由研究調查結果提供一個回收光阻的方法,讓TFT-LCD面板製造廠可與光阻回收廠商進行合作,以有效降低其面板製造成本。 光阻(Photoresist)為微影製程中最重要之化學物質,可以轉移設計於光罩上之圖形至玻璃基板表面,製造出薄膜電晶體。將正型廢光阻劑回收再利用於相同製程中,若能維持產品品質,則不僅可有效降低在陣列製程(Array) 部分3.5 ~ 5世代機台黃光段的生產成本,提升光阻使用效率,同時可達節能減碳目的。 本研究利用一連串的實驗來驗證將再生光阻使用於相同黃光製程之可行性。首先利用光阻廢液固含量與Cup Wash關係之探討、Spin Curve實驗、再生光阻標準曝光/顯影參數之找尋、殘膜率(Dark Erosion)實驗、曝光能量(Eth)之決定以及光阻附著(Adhesion)能力量測實驗等,確認再生光阻之各項特性。其次利用相關檢測儀器,比較一般光阻原液與廢液之內含物、檢驗光阻物理性質、檢測金屬離子含量、光阻塗佈色差(Mura)及缺陷(Defect),以及比較光阻線寬分佈情形等,檢驗將再生光阻塗佈於玻璃上的各種表現,以進一步判斷再生光阻之適用性。 本論文研究結論指出,回收光阻可使用在生產線上,但在產品的選擇上,主要仍以非金屬層為主,且須準確的控制回收光阻重製完後的光阻黏度;而在收集廢光阻劑部分,亦須控制廢光阻劑回收後擺放時間,避免回收光阻品質異常。

並列摘要


Abstract The main purpose of this research is to construct an methodology to evaluate the possibility of recycling of photoresist used in the photolithographic processing of TFT-LCD production line. From the results obtained in this study, it is expected to promote the cooperation between the TFT-LCD panel manufacturer and photoresist recycling company and finally an efficient method to recycle the waste photoresist can be produced. This will greatly shorten the evaluation procedure and reduce the production cost of panels for TFT-LCD panel manufacturers. Photoresist is the most important chemical material used in photolithography process. It is used to transfer the circuit pattern designed on the photomask to the glass substrate surface during a thin film transistor processing. In this study we examine the recycling possibility of the positive photoresist for the same process. If this possibility is recognized, the manufacture cost of generation 3.5~5 photo line of array process in LCD production and the waste of photoresist can be reduced. It can also make the use of photoresist more effectively without losing the product quality. A series of experiments were conducted to evaluate the recycled photoresist for being reused in the same photolithographic processing; including the spin coater cup wash, spin curve, developing time, dark erosion, exposing energy, adhesion, and use the instrument to compare the original and the waste photoresists, physical properties, metal content, mura & defect, critical dimension. It is concluded that the recycling of photoresist on the non-metal layer is possible during the mass-production of TFT-LCD panels under the condition that the viscosity of recycled photoresist is well controlled. In addition, the storage time of recycled photoresist after being gathered must be well noticed to prevent the deterioration of its quality.

參考文獻


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