壓電陶瓷表面濺鍍銅膜研究

The study of Cu films coated on piezoelectric ceramic by magnetrons sputtering

彭士芳(Shih-Fang Peng)

指導教授 ： 丁鏞

中原大學/工學院/機械工程研究所/碩士(2017年)

https://doi.org/10.6840/cycu201700442

摘要

摘要
本文探討利用磁控濺鍍法(magnetron sputtering)在壓電陶瓷(PZT) 上濺鍍銅(Cu)薄膜，藉由不同濺鍍條件如功率、鍍膜次數、氮氣濃度、真空壓力、時間等參數，製作不同參數條件，並藉由d33特性分析薄膜的關係，也利用X-ray繞射儀(X-ray diffraction, XRD)量測不同薄膜的晶相與繞射角度(diffraction angle)，利用原子顯微儀(Atomic force microscope, AFM)分析薄膜上的表面粗糙度Ra、Rz與Rq的數值分析關係。
實驗結果顯示濺鍍功率越高具有高厚度的膜層與比較高的d33壓電係數。使用X-ray繞射儀分析顯示薄膜在鐵電鈣鈦礦相(110)最高，繞射角度2σ= 30.8°有最佳晶相強度。利用原子顯微儀測量表面粗糙度量測使用同功率1.5KW濺鍍不同射層(10,15,20)的Ra值分別為(2.3,13.21,23.55）nm；使用同功率為2.0KW濺鍍不同射層(10,15)的濺射層的的Ra值分別為(10,70.17)nm。因此，可得知在相同功率下當層數增加時表面粗糙度的Ra數值是持續增加上升，在相同10濺鍍層功率為(1.5,2,2.5)kw的Ra值分別為(2.3,10,15)nm，此外相同層數下功率越高表面粗糙度數值會持續增加，實驗得到使用1.5KW濺鍍 10層可以得到良好表面粗糙度特性。

關鍵字

磁控濺鍍 ； 表面粗糙度 ； 壓電材料 ； d33 ； AFM

並列摘要

Abstract
This study is focusing on coating copper films on PZT by magnetron sputtering with different controllable variables such as sputtering rates, coating times, nitrogen concentration, vacuum pressure and time. The d33 meter is used to analyze the characteristic of thin films. Crystalline phase and diffraction angle are measured by X-ray diffraction (XRD). Surface roughness Ra, Rz, and Rq on thin film is measured by scanning probe microscope to characterize the quality.
The experimental results indicate using higher sputtering rates will have thicker layer as well as gain larger d33. The XRD analysis shows that copper films possess high diffraction angle at 2σ= 30.8° in the ferro-electric perovskite phase, where preserves maximum crystal strength. By using AFM, surface roughness is measured to have Ra(2.3, 13.21, 23.55)nm for sputtering layers of (10, 15, 20) respectively with the same applied power of 1.5KW; and surface roughness is measured to have Ra(10,70.17)nm for sputtering layers of (10, 15) respectively with the same applied power of 2.0KW. Thus, it is concluded that as the number of layers increasing the surface roughness increases under the condition of same applied power. Surface roughness is measured to have Ra(2.3, 10, 15)nm for sputtering layers of 10 respectively with the same applied power of KW(1.5, 2, 2.5). Also, as the applied power increasing the surface roughness increases under the condition of same sputtering layers. In comparison, the sputtering layers of and applied power of 1.5KW will obtain good surface roughness.

並列關鍵字

magnetron sputtering ； surface roughness ； piezoelectric materials ； d33 ； AFM

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