使用TE11模式微波之磁旋諧振電漿/離子源之研究發展

The Development of a TE11 Mode Microwave Electron-Cyclotron-Resonance (ECR) Plasma/Ion Source

甯逢春(Fung-Truen Ning) ； 胡瑗(Yuan Hu) ； 林滄浪(Tsang-Lang Lin)

《真空科技》 16卷4期 (2004/04) Pp. 51-58

https://doi.org/10.29808/JVSROC.200404.0008

摘要

本項研究為利用自製的2.45GHz磁控管微波源，加上電磁鐵產生的軸向發散磁場，製作直徑10公分大的微波電子磁旋共振電漿／離子源。磁控管和微波元件裝設集中在一段導波管上，設計適當的微波耦合器，可以匹配電漿阻抗，提高微波能源效率，製成高密度電漿源。加上離子引出用的柵極組，可作成離子束流源。利用蘭密爾(Langmuir)探針量測電漿電流密度及電子溫度。
在400瓦的微波功率，1×10^(-3)mbar氬氣氣壓下，在出口下方15公分處可量得有1.5×10^11cm^(-3)的電漿密度，在直徑20公分區域內的電漿均勻度可達±5%。

並列摘要

We have presented a 10cm-diameter microwave electron cyclotron resonance plasma/ion source. The electromagnetic coils are used to provide an axial divergent magnetic field running through the source region. A magnetron from a microwave oven together with the necessary microwave components are assembled on one section of a rectangular waveguide to form the compact microwave source. The special coupling applicator is used to match the plasma impedance to the microwave source. The plasma source can be modified to an ion source by adding an extraction grid system. The Langmuir probe system is used to measure the plasma density and electron temperature.
The Argon plasma density is 1.5×10^11cm^(-3) at 15cm downstream under the condition of 400 watt microwave power and 1×10^(-3)mbar chamber pressure. The plasma density uniformity can reach±5% across20cm diameter there.