- 學位論文
利用奈米球鏡微影術製作垂直型態奈米光學天線之研究
Fabrication of Vertically Aligned Optical Nanoantenna using Nanospherical-Lens Lithography
摘要
在本篇論文中，我們將以低成本的奈米製程技術來製作覆蓋大面積的複雜奈米結構。首先，我們透過奈米球鏡微影術(NLL)於光阻層上製作出週期性的奈米孔洞陣列，再以孔洞遮罩微影術的概念，將此層作為之後蒸鍍金屬的遮罩。藉由我們提出的幾項關鍵製程技術，例如水平與垂直旋轉控制的斜向蒸鍍金屬、光阻厚度的控制等等，以更精準的旋轉角度與傾角的控制製作出精細的二維和三維奈米結構。最後，我們成功做出單體間隔小至20奈米的多聚體結構、垂直型態的二聚體結構以及倒立U型環。我們還進行了各種光學特性和理論的模擬以了解製作出的奈米結構特性，並和實驗量測結果相互驗證。我們相信這些改進的奈米製程技術在未來可以作為一種更有效的方式應用在超穎材料和其他可能的應用中。
並列摘要
In this dissertation, we have developed a cost-effective and high-throughput nanofabrication method to fabricate arrays of complex nanostructures covering a large area. Nanospherical-Lens Lithography (NLL) was first used to create periodic metal nanohole arrays on top of the photoresist film. These metal nanohole arrays serve as the evaporation mask during the subsequent material evaporation, which is similar to the concept of Hole-Mask Lithography. Several processing parameters, including various evaporation angles and the thickness of the photoresist film were precisely controlled to obtain various designed two-dimensional and three-dimensional nanostructures. The fabricated nanostructures include various plasmonic oligomers with spacing as small as 20 nm, vertically aligned dimers, and inverted U-ring. We also perform various optical characterization and theoretical simulation to understand the fabricated nanostructures. In the future, we believe that these modified nanofabrication techniques can be used as a more effective way for the application of metamaterials and other possible applications.