光誘導氧化鋅薄膜之表面潤濕最佳化研究

本研究係使用射頻磁控濺鍍系統(RF sputtering system)以氬電漿且無氧源環境下轟擊靶材於室溫下製備氧化鋅薄膜在光學玻璃基板上，其靶材使用商用及自製氧化鋅靶材(ZnO Target)。自組裝(Self-Assemble)氧化鋅薄膜於不同濺鍍功率、工作壓力及基板傾斜角度之參數中所製備。其薄膜微結構、結晶性、表面形貌、光學性質及表面潤濕性分別以場發射掃描式電子顯微鏡(FE-SEM)、X-ray繞射晶體結構分析儀(XRD)、原子力顯微鏡(AFM)、可見光光學檢測分析儀以及接觸角分析儀進行探討。由實驗結果顯示：所有氧化鋅薄膜在可見光波段均有高於80%的可見光平均穿透率；於射頻功率125 W(傾斜角度與工作壓力固定為0 o與3.0×10-2 torr)所沉積之氧化鋅薄膜有高疏水性質(CA=110.6 o)及較佳的c軸(0002)織構能力。氧化鋅薄膜經由UV光照射後由疏水性轉變為親水性，並靜置於暗室中於10小時即回復至初始疏水態，且於真空、氮氣、氧氣、氧氣、大氣環境中具有不同回復速率。最後成功以自製不銹鋼模具壓製氧化鋅靶材裝置於射頻磁控濺鍍系統沉積氧化鋅薄膜，其沉積之薄膜具有高穿透率且疏水性質。此結果具有潛力應用於多功能性奈米元件。

關鍵字

氧化鋅；織構；潤濕性；紫外光照射；疏水性；親水性

並列摘要

In this study, ZnO thin films were deposited onto glass substrates at room temperature by radio-frequency magnetron sputtering without oxygen source at low Ar working pressure. Self-assemble ZnO thin films were deposited under different sputtering power, working pressure, and oblique angle between target and sample holder. The crystalline orientation of ZnO films were confirmed by X-ray diffraction (XRD). All the ZnO films exhibit high transparency and a visible light averaged transmittance over 80%. The ZnO films exhibit the hydrophobic behavior, which are investigated by water contact angle (CA) measurement. Also, the effects of microstructure and surface morphology on the wetting properties of the as-deposited ZnO films were investigated by the cross-sectional field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM). However, the hydrophobic surface with nanostructure (CA=110.6o) were successfully formed by optimizing parameters were found to sputtering power of 125 W, that the oblique angle and working pressure were fixed at 0 o and 3.0×10-2 torr, respectively. After exposing in photoirradiation under ultraviolet (UV) environment, all the ZnO samples showed remarkable reversible transition from hydrophobic to super-hydrophilic, and could reconverted to their original hydrophobic state after been placed in dark for 10 hours. The corresponding reconversion rate and placed in five different ambiences (atmosphere, argon, nitrogen, oxygen and vacuum) were confirmed. It is demonstrated that the controllable wettability of ZnO films are switchable under changing between the UV photoirradiation and dark storage. The home-made ZnO target can be successfully prepared by universal tensile testers with stainless steel molds, and the ZnO films deposited by RF magnetron sputtering with self-made ZnO target were also exhibit high transparency and hydrophobic behavior. As a result, this study could provide important applications for many fields such as ZnO-based multifunctional devices with photoirradiation disinfection surfaces accompanied with reversible wettability switches.

並列關鍵字

Zinc oxide ； texture ； wettability ； ultraviolet photoirradiation ； hydrophobic ； hydrophilic

參考文獻

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光誘導氧化鋅薄膜之表面潤濕最佳化研究

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