應用實驗設計法於 彩色光阻配方開發驗證之最佳化參數研究

Optimum Design for Colored photo -resist formula research test by Applying DOE Method

彭永崴(Yung-Wei Peng)

指導教授 ： 張國華

中原大學/電機資訊學院/工業與系統工程研究所/碩士(2010年)

https://doi.org/10.6840/cycu201000574

摘要

國內兩兆雙星的主流產業為LCD產業與IC 產業，其中感光材料是LCD 和 IC 等電子產業中微影製程的主要關鍵性材料，尤其是面對LCD面板大面積的發展趨勢，感光材料的需求量更隨之大增，在競相降低成本以求提高競爭力的需求下，國內LCD產業已警覺到上下游材料整合的重要性，因此也給了國內感光材料生存的一線生機。
當今顯示器市場蓬勃發展，爲了滿足消費市場的需求下，面板的開發沿進以大尺寸、低價格、廣視角(Multi-domain Vertical Alignment)、廣色域(Wild Color Gamut)、高對比、高穿透度、高色彩飽和度等條件為主流，其中彩色濾光片(Color Filter)為液晶顯示器呈現色彩之關鍵材料，因此彩色濾光片色度(Colorimetric)要求條件亦相形嚴峻。在彩色濾光片製程上，彩色光阻之光微影製程因具備高信賴性、高解析度、耐溶劑特性及耐高溫特性，廣為業界採用，然而面板大型化與低價策略影響下，彩色濾光片更被要求降低成本，於是彩色光阻本土化之開發可降低材料成本。
目前在學術研究上，針對彩色光阻材料的開發與應用的選擇已有不少的研究報告，但對於RGB三色原光阻配方驗證的研究報告尚屬少之，原因為光阻配方使用的原料以及配方結構的參數及變數較大且又礙於專利的限制。
本文之研究為使用實驗設計法（Design of experiment）來找出影響RGB彩色光阻之配方結構的重要因子（Key Factor）及各因子間的交互作用並進行配方驗證，期望將光阻的開發能夠達到產品信賴性測試之規格，產品測試項目分為(1)對比值、(2)溶劑耐化性（Isopropyl Alcoho1、N-Methyl pyrrolidone、g-Butyrolactone、Diproylene Glycol Mono- butyl Ethre、2%NaOH）、(3)耐熱性等試驗表現的重要因子以及最適參數設定。彩色光阻(Color Resist)是彩色濾光片(Color Filter)的重要材料之ㄧ，而在彩色濾光片製程當中須經過許多化學製程，因此光阻材料的開發必須通過相關溶劑耐化性及耐熱性測試後，仍然維持良好的對比值以及低色差ΔEab＜3。
本研究爲確認RBG光阻之配方最佳化參數的設定為適當的，各別將最佳化的配方進行5個產品配方驗証實驗，其驗證的結果為最佳化配方結構是可接受的。

關鍵字

彩色光阻 ； 感光材料 ； 彩色濾光片 ； 實驗設計 ； 田口式品質工程

並列摘要

Abstract
The liquid crystal display and semiconductor are “Two Trillion and full Two Star” industries in Taiwan. The photosensitive material play an important role in LCD and IC industries and the demand of photosensitive material grows quickly, especially during the larger size LCD panel development. With the product cost down and worldwide competitions nowadays, domestic companies of LCD industry need collaboration closely. Therefore, it has also given a survival vitality for domestic photosensitive material.
To satisfy the demand of consumer market, larger size, low cost, multi-domain vertical alignment, wild color gamut, high contrast, high penetration and high color degree of saturation of multifunctional panel are necessary, especially the display market vigorous development at the moment. The “Color Filter” is the key material to present color for liquid-crystal display and the colorimetric request of color filter is very important. The advantage of high dependability, fine resolution, solvent characteristic and the thermo-stable characteristic in the lithography process, and it is widely used in domestic industry. However, under the influence of larger size panel and the low price strategy, the color filter is requested to reduce the cost. Consequently, the development of local colored photo-resist (color resist) material is necessary and it can reduce cost.
Previous studies on color filter have focused mainly on the application and the development of colored photo-resist (color resist) material. Very few have dealt with RGB photo-resist (color resist) formula confirmation. It is because the raw material of photo-resist formula, the parameters of formula structure and patent hindrance.
The research use the design of experiment to find out the key factor of formula structure of the RGB colored photo-resist (color resist) and the effect of interaction of each factor is investigated. We expect the research of photo-resist could meet the specifications of reliability test of products. The test items include (1) Contrast ratio value, (2) solvent characteristic and chemical characteristic (Isopropyl Alcoho1, N-Methyl pyrrolidone, g-Butyrolactone, Dipropylene Glycol Mono- butyl Ether, 2%NaOH), (3) thermal stability and so on. The color resist is an important material for the color filter, and it has many chemical process during the color filter production. Hence, after the solvent, chemical and thermally stability test, the photo-resist material must maintain the good correlative value as well as the low chromatic aberration; ΔEab< 3.
To confirm the optimization parameter of the RGB color resist formula is suitable in this study. We design five optimization product formula experiments to confirm the results will be may accept for these optimization formulas.

並列關鍵字

Taguchi methods ； Design of experiment ； Color Filter ； Color Photo Resist ； Photo Sensitive Material

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