中文摘要 先進的半導體製程技術不斷的再創新,從近期的45nm一直精進至28nm,甚至更要突破至10nm以下,而要做到高效能的行動運算製程與低耗電的能力,並提供廣泛的客制化製程能力,所以保有先進製程能力才能持續保持領先地位,從英特爾與台積電的互相較勁之下即可看出。 本研究以廠務端化學品供應系統的供應品質改善做為研究,除了原物料需要由品管部門來把關,在廠務端輸送化學品管路材質的品質或因施工階段造成的污染都會對所供應的化學品有所影響。以透過預先清洗化學品管路再供應的方式做為個案探討,應用雙因子變異數分析與統計分析手法,找出了原物料供應至生產線機台的微粒子來源,並減少使用原物料在做管路沖洗之步驟,進而節能減量減少物料成本的浪費。 先進製程總是需要經過不斷的嘗試與測試,才能經由實驗與研究分析中找到不同的結果,我希望能夠再提升自我的專業能力,再激盪出不同的創新思維。 關鍵字:VMB、微粒子計數器、管路清洗機
Abstract Advanced semiconductor process technology and innovation continuously, from the recent 45-nm to 28 nm, has been and even more to break through to 10 nm, and to do high-performance and low-power mobile computing processes the ability to provide a wide range of customization process capability, so in order to maintain the advanced process capabilities continue to maintain a leading position, Can be seen from Intel and TSMC under mutual rivalry. The factory high-quality in central supply chemical system as research, in addition to raw materials needed by the QC department to check, factory quality control services in central supply chemical materials will have an impact, this research through pre-cleaning chemical pipe reduce the supply pipe of raw materials to the production line of particles, reducing the use of raw materials to do the amount of flushing the pipeline, thereby reducing material cost saving reduction. Advanced process always needs through constant trial and test, Can be through experiments and research analysis has different results, I hope to further enhance the professional capabilities of self, and then bring out the different innovative thinking Keyword:VMB(Valve Manifold Box)、Particle counter、Piping clean machine