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Search Symbol (Half-width) Description of Search Symbols
Space "AND" indicates the intertwining of key terms used in a search
Double Quotation Marks ("") ( " " ) Double quotation marks indicate the beginning and end of a phrase, and the search will only include terms that appear in the same order of those within the quotations. Example: "image process" : " image process "
? Indicates a variable letter. Entering two ? will indicate two variable letters, and so on. Example: "Appl?", search results will yield apple, apply… e , appl y … ( (often used to English word searches) )
* Indicates an unlimited number of variable letters to follow, from 1~n. Example: Enter "appl*", search results will yield apple, apples, apply, applied, application…(often used in English word searches) e , appl es , appl y , appl ied , appl ication … ( (often used to English word searches) )
AND、OR、NOT

Boolean logic combinations of key words is a skill used to expand or refine search parameters.
(1) AND (1) AND: Refines search parameters
(2) OR (2) OR: Expands search parameters (3) NOT: Excludes irrelevant parameters

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DOI stands for Digital Object Identifier ( D igital O bject I dentifier ) ,
and is the unique identifier for objects on the internet. It can be used to create persistent link and to cite articles.

Using DOI as a persistent link

To create a persistent link, add「http://dx.doi.org/」 「 http://dx.doi.org/ 」 before a DOI.
For instance, if the DOI of an article is 10.5297/ser.1201.002 , you can link persistently to the article by entering the following link in your browser: http://dx.doi.org/ 10.5297/ser.1201.002
The DOI link will always direct you to the most updated article page no matter how the publisher changes the document's position, avoiding errors when engaging in important research.

Cite a document with DOI

When citing references, you should also cite the DOI if the article has one. If your citation guideline does not include DOIs, you may cite the DOI link.

DOIs allow accurate citations, improve academic contents connections, and allow users to gain better experience across different platforms. Currently, there are more than 70 million DOIs registered for academic contents. If you want to understand more about DOI, please visit airiti DOI Registrationdoi.airiti.com ) 。

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Abstract 〈TOP〉
Parallel Abstract 〈TOP〉
Reference ( 22 ) 〈TOP〉
  1. 2.王俊偉,以生產管理面探討TFT-LCD件廠規劃之研究,中原大學碩士學位論文,2004,p.3
    連結:
  2. 8. C. W. Kim, Y. B. Park, H. S. Kong, D. G. Kim, S. J. Kang, J. W. Jang, and S. S. Kim, A Novel Four-Mask-Count Process Architecture for TFT-LCDs, SID 00 DIGEST, 2000, 42.1, p.1006-1009
    連結:
  3. 10. Seungjin Choi, Jinhui Cho, Kyu-yong Han, J. H. Jang, J. G. Park, H. J. Yoon, B. N. Yoon , S. H. Ihm, and Young Jin Lim, Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask, SID 05 DIGEST;2005, P-16, p284-p287
    連結:
  4. 11. Jean H. Song, D. J. Kwon, S. G. Kim, N. S. Roh, H. S. Park, Y. B. Park, D. G. Kim, C. O. Jeong, H. S. Kong, C. W. Kim, and K. H. Chung, Advanced Four-Mask Process Architecture for the a-Si TFT Array Manufacturing Method, SID 02 DIGEST, 2002, 34.1, p1038-p1041
    連結:
  5. 12. 蔡文勇,I-Line光阻劑於TFT LCD Array製程之應用極評估,中央大學碩士學位論文,2006,p.26
    連結:
Times Cited (3) 〈TOP〉
  1. 林志誠(2013)。液晶貼合製程參數對真空組立精度影響研究。中興大學電機工程學系所學位論文。2013。1-114。 
  2. 戴謙邦(2012)。灰化製程對鉻及氧化銦錫接觸阻抗之影響。中央大學機械工程研究所碩士在職專班學位論文。2012。1-68。
  3. 劉禹廷(2013)。應用於薄膜電晶體之半色調光罩微影製程參數特性探討。中興大學光電工程研究所學位論文。2013。1-68。
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