整合自組裝奈米球微影與光輔助電化學蝕刻之奈米柱狀陣列製作技術

Nanopillar array fabrication by integrating self-assembly nanosphere lithography and photo-assisted electrochemical etching technique

黃茂榕(Huang Mao-Jung)

指導教授 ： 楊啟榮

國立臺灣師範大學/科技學院/機電科技研究所/碩士(2004年)

摘要

無資料

關鍵字

奈米柱 ； 奈米球 ； 光輔助電化學蝕刻 ； 自組裝

並列摘要

The research has developed a novel method of Nanopillar array through the combination of integrating self-assembly nanosphere lithography and photo-assisted electrochemical etching technique.
The self-assembly nanosphere lithography technique can be used to define nano-pattern array by the novel coating method. The novel coating method of nanosphere can regular arrange nanosphere in some region of whole 1 cm2 wafer.
In experiment of photo-assisted electrochemical etching, surfactant can reduce contact angle of electrolyte and obtain high aspect ratio of nanohole easily. The highest aspect ratio of nanohole is 68:1. We have finished the novel fabrication process of nanopillar array without expensive equipments. Nanopillar can regular arranged, which dimensions is 70 nm~50 nm wide and 1000 nm tall (aspect ratio, 14~20:1).

Keywords: nanopillar, nanosphere, electrochemical etching, self-assembly.

並列關鍵字

nanopillar ； nanosphere ； electrochemical etching ； self-assembly