奈米球鏡微影術製作表面電漿超穎材料之研究

盧思辰

doi:10.6844/NCKU.2013.01521

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奈米球鏡微影術製作表面電漿超穎材料之研究

Fabrication of Plasmonic Metamaterials using Nanospherical-Lens Lithography

盧思辰 , Masters　　Advisor：張允崇　　

繁體中文 DOI： 10.6844/NCKU.2013.01521

奈米球鏡微影術；侷域性表面電漿共振；超穎材料； Nanospherical-Lens Lithography ； LSPR ； Metamaterials

Abstract │ Reference (32) │ Altmetrics

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In this dissertation, nanofabrication using Nanosphere and Nanospherical-Lens Lithography will be demonstrated. Large area of Ag nanohole array is fabricated by plasma-assisted Nanosphere Lithography and is subsequently transfer to a flexible substrate by template stripping method. The Ag nanohole array, which exhibits low sheet resistance and high transmittance around 600 nm can be used as transparent conducting electrode layer of organic light emitting devices.
In addition, Nanospherical-Lens lithography using either a symmetry or asymmetry ultraviolet (UV) light source is also investigated in this research. First, a commercial Hg lamp, whose emission pattern is round-shaped, is used as the light source. Several key technologies, including small angled deposition, angled exposure process and rotational angled deposition, are also developed to fabricate nanoparticle dimer, trimer, tetramer, pentamer, hexamer, and heptamer arrays. Nano-ring and nano-C arrays are also successfully demonstrated.  
An asymmetry light source is a commercial hand-held UV lamp, whose emission pattern is very different between the direction parallel and perpendicular to the lamp direction. This results in the elliptical-shaped focusing patterns by the nanospherical lenses. We have found out that the long axis of the nano-ellipse is parallel to the lamp direction and the length of the long axis can be tuned by varying the exposure durations. The aspect ratio of the nano-ellipse is related to the diameters of the nanosphere, as larger nanospheres results in higher aspect ratios. The LSPR of the nano-ellipses is tunable from 1300 to 2000 cm-1, which is a perfect platform for surface-enhanced infrared absorption (SEIRA). We also demonstrate the fabrication of IR metamaterials and planar chiral metamaterials by performing multiple exposures with controlled sample location, angle to the lamp, and exposure duration.  
In summary, we have demonstrated the ability to fabricate various metal nanostructures using either Nanosphere lithography or Nanospherical-Lens Lithography. We believe these methods are suitable to fabricate more complex patterns and are thus powerful tools for future metamaterials applications.

Reference ( 32 ) 〈TOP〉

[1] N. D. Denkov, O. D. Velev, P. A. Kralchevsky, I. B. Ivanov, H. Yoshimura, and K. Nagayamat, “Mechanism of Formation of Two-Dimensional Crystals from Latex Particles on Substrates.,” Langmuir, vol. 8, no. 12, pp. 3183–3190, 1992.
連結：
[2] A. D. Ormonde, E. C. M. Hicks, J. Castillo, and R. P. Van Duyne, “Nanosphere Lithography : Fabrication of Large-Area Ag Nanoparticle Arrays by Convective Self-Assembly and Their Characterization by Scanning UV-Visible Extinction Spectroscopy.,” Langmuir, vol. 20, no. 16, pp. 6927–6931, 2004.
連結：
[3] A. J. Haes, C. L. Haynes, A. D. Mcfarland, and G. C. Schatz, “Plasmonic Materials for Surface-Enhanced Sensing and Spectrosopy.,” MRS BULLETIN, vol. 30, no. May, 2005.
連結：
[4] A. Koroleva, M. L. Arnedillo, R. Kiyan, O. Marti, and B. N. Chichkov, “Laser Fabrication of Large-Scale Nanoparticle Arrays for Sensing Applications.,” ACSNANO, vol. 5, no. 6, pp. 4843–4849, 2011.
連結：
[5] L. S. Live and O. R. Bolduc, “Propagating Surface Plasmon Resonance on Microhole Arrays.,” Analytical Chemistry, vol. 82, no. 9, pp. 3780–3787, 2010.
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