提升UV集光罩於曝光機效能之研究

Study of Enhancing Performance of UV Oval Condenser Mirror of Exposure Machine

王貞凱(Chen-Kai Wang)

指導教授 ： 謝振榆

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2014年)

https://doi.org/10.6827/NFU.2014.00249

摘要

本研究係以物理氣相沈積法-電子槍蒸鍍/PVD-EBGE (Physical Vapor Deposition-Electron Beam Gun Evaporation)，來製作由ZrO2/SiO2所組合的紫外線(UV)反射膜，探討多層膜UV反射膜的光學特性、集光罩表面粗糙度，藉以求得最佳之製程參數，製作出高品質的UV集光罩，以利UV曝光機相關產業的應用。
經由反覆測試與實驗，做出多層膜UV集光罩，量測結果分析與探討，不僅在曝光機的主要工作波段350 ~ 450 nm有超過95%的反射率，紅外線熱源的部份也有90%以上的穿透，有效降低光源照射在工件上的溫度，光學特性已達曝光機應用產業的標準，上機實測表現達到小於熱衝擊指標的250 ℃以內，UV集光罩的品質與穩定性已可與目前市場上主流之日本原裝進口品相比擬，有助於台灣曝光機產業在光學元件購置成本上降低至少35%，提升產業競爭力。

關鍵字

光學薄膜 ； 多層膜 ； 高反射 ； 曝光機

並列摘要

In this thesis presents that two materials of ZrO2 and SiO2 were used to prepare multi-dielectric layers by an electron-gun evaporation technique. Measurements and analysis for the optical properties, surface roughness, We expect to get more information about multilayer coatings in ultraviolet (UV) Oval Condenser Mirror.

After running several tests and experiments, we have produced multilayer coatings for UV reflector. Based on the various measuring data analysis, the main working wave of Exposure machine is between 350- 450nm with more than 95% reflection rate. The source of infrared rays has 90% penetration. It can lower the temperature on the object effectively. The characteristic of optic has reached the industrial standard. The result of performance on the actual machine has reached the heat impact index within 250℃. The quality and stability of the UV reflector is able to compete with the current mainstream from Japanese OEM product. Besides, it can assist optical components of Taiwan in lowing the cost of purchasing optical part 35% minimum as well as enhancing the competitiveness.

並列關鍵字

optical thin films ； multilayer ； high reflection ； exposure machine

參考文獻

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